Synthesis and characterization of new inherent photoimageable polyimides based on fluorinated tetramethyl-substituted diphenylmethanediamines

被引:51
作者
Qian, ZG
Ge, ZY
Li, ZX
He, MH
Liu, JG
Pang, ZZ
Fan, L
Yang, SY [1 ]
机构
[1] Chinese Acad Sci, Inst Chem, Ctr Mol Sci, State Key Lab Engn Plast, Beijing 100080, Peoples R China
[2] Chinese Acad Sci, Inst Chem, Ctr Mol Sci, Adv Polymer Mat Lab, Beijing 100080, Peoples R China
[3] Beijing Univ Chem Technol, Sch Mat Sci & Engn, Beijing 100029, Peoples R China
关键词
photoimageable polyimides; solubility; photosensitivity;
D O I
10.1016/S0032-3861(02)00494-9
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
A novel fluorinated tetramethyl-substituted diphenylmethanediamine, alpha,alpha-bis(4-amino-3,5-dimethylphenyl)-3'-trifluoromethylphenylmethane (TFPM) was synthesized via a straightforward two-step procedure with high yield, which was then employed to react with 3,3',4,4'-benzophenonetetracarboxylic dianhydride (BTDA) to afford soluble and inherent photoimageable polyimide BTDA-TFPM [PI(BTDA-TFPM)]. Experimental results indicated that PI(BTDA-TFPM) possesses good combined chemical and physical properties, of which thermal stability with initial thermal decomposition temperature of 526degreesC and glass transition temperature of 298degreesC. The polyimide has excellent solubility both in strong bipolar solvents, such as NMP and DMAc, and in common organic solvents, such as THF and dioxane, etc. Strong and flexible polymer coatings or films could be prepared by just casting the polymer solution on glass substrate, followed by thermal baking at a temperature lower than 200degreesC. The novel polyimide has good electric insulating properties and low dielectric constant and dissipation factor. Fine photopattern could be processed by directly exposing the polyimide coating upon UV i-line, followed by developing with an organic solution developer. (C) 2002 Published by Elsevier Science Ltd.
引用
收藏
页码:6057 / 6063
页数:7
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