Chemical effects in C60 irradiation of polymers

被引：49
作者：
Moellers, R.
Tuccitto, N.
Torrisi, V.
Niehuis, E.
Licciardello, A.
机构：
[1] ION TOF GmbH, D-48149 Munster, Germany
[2] Univ Catania, Dipartimento Sci Chim, I-95125 Catania, Italy
来源：
APPLIED SURFACE SCIENCE | 2006年 / 252卷 / 19期
关键词：
ToF-SIMS; cluster SIMS; fullerene ion beam; depth profiling; polymers; radiation damage; PRIMARY ION-BOMBARDMENT; MASS-SPECTROMETRY; THIN-FILMS; BEAM; POLY(ACRYLATES); DEGRADATION; CHAIN;
D O I：
10.1016/j.apsusc.2006.02.083
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
The C-60 erosion behaviour of poly(methyl)methacrylate (PMMA), poly(alpha-methyl) styrene (PAMS) and polystyrene (PS) has been studied at various temperatures and compared with that under Ga+ irradiation. Strong variations of erosion yields are observed, indicating that chemical degradation mechanisms are operating. In particular, our results suggest that fast depolymerization mechanisms are important in leaving the surface of the sputter crater virtually undamaged. Since such mechanisms are connected with the chemical nature of the polymer, the possibility of performing molecular depth profiling of polymers with C-60 appears to depend strongly on the chemical nature of the system under study. (c) 2006 Elsevier B.V. All rights reserved.
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页码：6509 / 6512
页数：4
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