InAs quantum dots (QDs) on a GaNAs buffer layer by metalorganic chemical vapor deposition were investigated, focusing on the relation between the dot shape property and photoluminescence characteristics. Utilization of the GaNAs buffer layer restricted the dot evolution in the direction of height to result in the InAs supply independence of the emission wavelength. The nitrogen composition also influenced a little the dot shape. The emission efficiency was improved by the change of the dot morphology. The peak wavelength of 1280 nm, which was 40 nm increase from the sample without GaNAs, was obtained from InAs QDs on a GaNAs buffer layer with high intensity. (c) 2006 Published by Elsevier B.V.
机构:Korea Res Inst Standards & Sci, Nanosurface Grp, Taejon 305340, South Korea
Cho, ET
Lee, HD
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机构:Korea Res Inst Standards & Sci, Nanosurface Grp, Taejon 305340, South Korea
Lee, HD
Lee, DW
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机构:Korea Res Inst Standards & Sci, Nanosurface Grp, Taejon 305340, South Korea
Lee, DW
Lee, JI
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Korea Res Inst Standards & Sci, Nanosurface Grp, Taejon 305340, South KoreaKorea Res Inst Standards & Sci, Nanosurface Grp, Taejon 305340, South Korea
Lee, JI
Jung, SI
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机构:Korea Res Inst Standards & Sci, Nanosurface Grp, Taejon 305340, South Korea
Jung, SI
Yoon, JJ
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机构:Korea Res Inst Standards & Sci, Nanosurface Grp, Taejon 305340, South Korea
Yoon, JJ
Leem, JY
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机构:Korea Res Inst Standards & Sci, Nanosurface Grp, Taejon 305340, South Korea
Leem, JY
Han, IK
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机构:Korea Res Inst Standards & Sci, Nanosurface Grp, Taejon 305340, South Korea
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Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, Key Lab Excited State Proc, Changchun 130033, Peoples R China
Chinese Acad Sci, Grad Sch, Beijing 100049, Peoples R ChinaChinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, Key Lab Excited State Proc, Changchun 130033, Peoples R China
Yu, Shuzhen
Miao, Guoqing
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Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, Key Lab Excited State Proc, Changchun 130033, Peoples R ChinaChinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, Key Lab Excited State Proc, Changchun 130033, Peoples R China
Miao, Guoqing
Xie, Jianchun
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Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, Key Lab Excited State Proc, Changchun 130033, Peoples R ChinaChinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, Key Lab Excited State Proc, Changchun 130033, Peoples R China
Xie, Jianchun
Jin, Yixin
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Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, Key Lab Excited State Proc, Changchun 130033, Peoples R ChinaChinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, Key Lab Excited State Proc, Changchun 130033, Peoples R China
Jin, Yixin
Zhang, Tiemin
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Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, Key Lab Excited State Proc, Changchun 130033, Peoples R China
Chinese Acad Sci, Grad Sch, Beijing 100049, Peoples R ChinaChinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, Key Lab Excited State Proc, Changchun 130033, Peoples R China
Zhang, Tiemin
Song, Hang
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Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, Key Lab Excited State Proc, Changchun 130033, Peoples R ChinaChinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, Key Lab Excited State Proc, Changchun 130033, Peoples R China
Song, Hang
Jiang, Hong
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Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, Key Lab Excited State Proc, Changchun 130033, Peoples R ChinaChinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, Key Lab Excited State Proc, Changchun 130033, Peoples R China
Jiang, Hong
Li, Zhiming
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Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, Key Lab Excited State Proc, Changchun 130033, Peoples R ChinaChinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, Key Lab Excited State Proc, Changchun 130033, Peoples R China