Characterization of sputtered barium strontium titanate and strontium titanate thin films

被引:97
作者
Baumert, BA
Chang, LH
Matsuda, AT
Tsai, TL
Tracy, CJ
Gregory, RB
Fejes, PL
Cave, NG
Taylor, DJ
Otsuki, T
Fujii, E
Hayashi, S
Suu, K
机构
[1] ADV MAT GRP,MAT RES & STRATEG TECHNOL,AUSTIN,TX 78721
[2] MATSUSHITA ELECT CORP,ELECT RES LAB,TAKATSUKI,OSAKA 569,JAPAN
[3] ULVAC JAPAN LTD,CHIBA INST SUPER MAT,SANBU,CHIBA 28912,JAPAN
关键词
D O I
10.1063/1.366066
中图分类号
O59 [应用物理学];
学科分类号
摘要
Sputtered Ba1-xSrxTiO3 (BST) and SrTiO3 (STO) films and capacitors made with these dielectrics have been characterized with respect to physical and electrical properties. Specific capacitance values included a high of 96 fF/mu m(2) for BST films deposited of 600 degrees C and a high of 26 fF/mu m(2) for STO films deposited at 400 degrees C. Leakage current densities at 3.3 V for the most part, varied from mid 10(-8) to mid 10(-6) A/cm(2). All of the dielectrics are polycrystalline, although the lowest temperature STO films have a nearly amorphous layer which impacts their capacitance. Grain size increases with deposition temperature, which correlates to higher dielectric constants. The lattice parameter of the BST films is larger than that of bulk samples. Capacitance, leakage, breakdown, and lifetime results are reported. (C) 1997 American Institute of Physics.
引用
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页码:2558 / 2566
页数:9
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