Laser-induced optical changes in amorphous multilayers

被引:41
作者
Malyovanik, M
Ivan, S
Csik, A
Langer, GA
Beke, DL
Kökényesi, S
机构
[1] Debrecen Univ, Dept Solid State Phys, H-4010 Debrecen, Hungary
[2] Uzhgorod Natl Univ, Uzhgorod, Ukraine
[3] Hungarian Acad Sci, Inst Nucl Res, H-4001 Debrecen, Hungary
[4] Debrecen Univ, Dept Expt Phys, H-4001 Debrecen, Hungary
关键词
D O I
10.1063/1.1526157
中图分类号
O59 [应用物理学];
学科分类号
摘要
It is shown that the well-known blueshift of the fundamental absorption edge in as-deposited compositionally modulated amorphous Si/Ge and As6Se94/Se80Te20 multilayers (with periods of 4-8 nm) is further enhanced due to the thermal or laser-induced intermixing of adjacent layers. The laser-induced intermixing process, as supported by experiments and model calculations, can be attributed to both the local heating and photo-effects in As6Se94/Se80Te20 multilayers, while only the thermal effects were observed for Si/Ge multilayers. Structural transformations, based on this enhanced interdiffusion, provide good capability for spatially patterning optoelectronic devices and digital information recording. (C) 2003 American Institute of Physics.
引用
收藏
页码:139 / 142
页数:4
相关论文
共 22 条
[1]   SOME CALCULATIONS OF TEMPERATURE PROFILES IN THIN-FILMS WITH LASER-HEATING [J].
ABRAHAM, E ;
HALLEY, JM .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1987, 42 (04) :279-285
[2]   Diffusion and thermal stability in multilayers [J].
Beke, DL ;
Langer, GA ;
Csik, A ;
Erdélyi, Z ;
Kis-Varga, M ;
Szabó, IA ;
Papp, Z .
DIFFUSIONS IN MATERIALS: DIMAT2000, PTS 1 & 2, 2001, 194-1 :1403-1415
[3]  
BEKE DL, 1999, FUNCTIONAL MAT, V6, P539
[4]  
BERNING P, 1967, PHYSICS THIN FILMS
[5]  
Borisova ZU, 1983, Chalcogenide semiconductor glasses
[6]   OPTICAL CHARACTERIZATION OF GAAS/ALGAAS NANOSTRUCTURES FABRICATED BY FOCUSED LASER-BEAM INDUCED THERMAL INTERDIFFUSION [J].
BRUNNER, K ;
ABSTREITER, G ;
WALTHER, M ;
BOHM, G ;
TRANKLE, G .
SURFACE SCIENCE, 1992, 267 (1-3) :218-222
[7]  
CHOI WK, 2001, SCRIPTA MATER, V44, P1875
[8]  
Csik A, 2001, J OPTOELECTRON ADV M, V3, P33
[9]   Interdiffusion in amorphous Si/Ge multilayers by Auger depth profiling technique [J].
Csik, A ;
Langer, GA ;
Beke, DL ;
Erdélyi, Z ;
Menyhard, M ;
Sulyok, A .
JOURNAL OF APPLIED PHYSICS, 2001, 89 (01) :804-806
[10]   Stress effects on interdiffusion in amorphous multilayers [J].
Greer, AL .
DIFFUSION AND STRESSES, 1996, 129 :163-179