Ion implantation processing of sub-stoichiometric titanium nitrides and carbonitrides: Chemical structural and micromechanical investigations

被引:35
作者
Guemmaz, M
Mosser, A
Grob, JJ
机构
[1] GSI, IPCMS, F-67037 STRASBOURG, FRANCE
[2] PHASE, F-67037 STRASBOURG, FRANCE
来源
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1997年 / 64卷 / 04期
关键词
D O I
10.1007/s003390050497
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Sub-stoichiometric titanium nitrides TiNx (x = 0.25, 0.45 and 0.61) and carbonitride TiNxCy (x = 4 = 0.35) were synthesized at the titanium surface by multiple energy (180, 100, 50 and 20 keV) ion implantation. The in-depth distributions of carbon and nitrogen deduced from RBS and SIMS spectra were compared with TRIM calculations. From the X-ray grazing incidence we observed the following structures: (i) An NaCl type structure for TiN0.35C0.35 and TiN0.25, the latter is commonly known as delta-titanium nitride; (ii) A nitrogen solid solution in an alpha-Ti structure for TiN0.25, and a mixture of both structures for TiN0.45 In the case of the NaCl structures, the layers were composed of very small strained crystallites (nanocrystals). X-ray photoelectron spectroscopy of C 1s, N 1s and Ti 2p levels, as well as the valence band spectrum, show that the carbon and the nitrogen are fully bonded to titanium. Nanoindentation measurements show an elastoplastic behavior for the layers. The hardness and Young's modulus were derived from load-displacement curves. The results were discussed in the light of the published work.
引用
收藏
页码:407 / 415
页数:9
相关论文
共 44 条
[1]   INFLUENCE OF POLYCRYSTAL GRAIN SIZE ON SEVERAL MECHANICAL PROPERTIES OF MATERIALS [J].
ARMSTRONG, RW .
METALLURGICAL TRANSACTIONS, 1970, 1 (05) :1169-+
[2]  
Barrett C.S., 1966, STRUCTURE METALS, P239
[3]   TITANIUM ALPHA-NITROGEN SOLID-SOLUTION FORMED BY HIGH-TEMPERATURE NITRIDING - DIFFUSION OF NITROGEN, HARDNESS, AND CRYSTALLOGRAPHIC PARAMETERS [J].
BARS, JP ;
DAVID, D ;
ETCHESSAHAR, E ;
DEBUIGNE, J .
METALLURGICAL TRANSACTIONS A-PHYSICAL METALLURGY AND MATERIALS SCIENCE, 1983, 14 (08) :1537-1543
[4]   QUANTITATIVE AES AND XPS INVESTIGATION OF MAGNETRON SPUTTERED TINX FILMS [J].
BENDER, H ;
PORTILLO, J ;
VANDERVORST, W .
SURFACE AND INTERFACE ANALYSIS, 1989, 14 (6-7) :337-346
[5]   TIN, TIC AND TI(C,N) FILM CHARACTERIZATION AND ITS RELATIONSHIP TO TRIBOLOGICAL BEHAVIOR [J].
BERTONCELLO, R ;
CASAGRANDE, A ;
CASARIN, M ;
GLISENTI, A ;
LANZONI, E ;
MIRENGHI, L ;
TONDELLO, E .
SURFACE AND INTERFACE ANALYSIS, 1992, 18 (07) :525-531
[7]   STRUCTURE AND PROPERTIES OF TITANIUM NITRIDE THIN-FILMS DEPOSITED AT LOW-TEMPERATURES USING DIRECT-CURRENT MAGNETRON SPUTTERING [J].
ELSTNER, F ;
EHRLICH, A ;
GIEGENGACK, H ;
KUPFER, H ;
RICHTER, F .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1994, 12 (02) :476-483
[8]  
ENSINGER W, 1991, J MATER SCI, V26, P6722, DOI 10.1007/BF02402666
[9]   NITRIDATION OF POLYCRYSTALLINE TITANIUM AS STUDIED BY INSITU ANGLE-RESOLVED X-RAY PHOTOELECTRON-SPECTROSCOPY [J].
ERMOLIEFF, A ;
BERNARD, P ;
MARTHON, S ;
WITTMER, P .
SURFACE AND INTERFACE ANALYSIS, 1988, 11 (11) :563-568
[10]   RESIDUAL-STRESS AND X-RAY ELASTIC-CONSTANTS IN HIGHLY TEXTURED PHYSICALLY VAPOR-DEPOSITED COATINGS [J].
FILLIT, RY ;
PERRY, AJ .
SURFACE & COATINGS TECHNOLOGY, 1988, 36 (3-4) :647-659