Nonlinear optical properties of Cu nanoparticles embedded in insulators by high-current Cu- implantation

被引:48
作者
Takeda, Y
Zhao, JP
Lee, CG
Gritsyna, VT
Kishimoto, N
机构
[1] Natl Res Inst Met, Tsukuba, Ibaraki 3050003, Japan
[2] Acad Sinica, Shanghai Inst Met, Shanghai 200050, Peoples R China
[3] Kharkov AM Gorkii State Univ, UA-310077 Kharkov, Ukraine
关键词
ion implantation; silica; quartz; Cu nanoparticle; optical properties; nonlinear properties;
D O I
10.1016/S0168-583X(99)00798-3
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Optical properties including nonlinear susceptibility and response were investigated for insulators with embedded nanoparticles fabricated by ion implantation. Negative ion implantation at various dose rates has been applied to generate the Cu nanoparticles in amorphous and crystalline SiO2. Optical absorption strongly depended on the dose rate, ranged from 1 to 100 mu A/cm(2), being influenced by a sputtering effect, radiation damage and an annealing effect of irradiation. Third-order optical susceptibility, evaluated with the degenerate four-wave mixing, yielded values of 1-2 x 10(-8) esu in good correlation with the absorbance. Transient absorption was also measured with the pump-probe method using a femtosecond laser system. The time-resolved differential optical density of as-implanted samples decayed within 10 Ds more slowly than that of annealed ones. The slower decay was attributed to the slower energy transfer from the electron to the phonon system, in the as-implanted particles. (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:877 / 881
页数:5
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