Electronic structures of GaN edge dislocations

被引:124
作者
Lee, SM
Belkhir, MA
Zhu, XY
Lee, YH [1 ]
Hwang, YG
Frauenheim, T
机构
[1] Jeonbuk Natl Univ, Dept Semicond Sci & Technol, Jeonju 561756, South Korea
[2] Jeonbuk Natl Univ, Semicond Phys Res Ctr, Jeonju 561756, South Korea
[3] Wonkwang Univ, Dept Phys, Iksan 570749, South Korea
[4] Univ Gesamthsch Paderborn, Fachbereich Phys, D-33095 Paderborn, Germany
[5] Jeonbuk Natl Univ, Dept Phys, Jeonju 561756, South Korea
关键词
D O I
10.1103/PhysRevB.61.16033
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We investigate atomic and electronic structures of the threading edge dislocations of GaN using self-consistent-charge density-functional tight-binding approaches. Full-core, open-core, Ca-vacancy, and N-vacancy edge dislocations are fully relaxed in our total-energy scheme. The Ca-vacancy dislocation is the most stable in a wide range of Ga chemical potentials, whereas full-core and open-core dislocations are more stable than others in the Ga-rich region. Partial dehybridization takes place during the lattice relaxation near the dislocation in all cases. The dangling bonds at Ga atoms mostly contribute to the deep-gap states, whereas those at N atoms contribute to the valence-band tails. All the edge dislocations can act as deep trap centers, except the Ga-vacancy dislocation, which may act as an origin of yellow luminescence.
引用
收藏
页码:16033 / 16039
页数:7
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