Scanning x-ray excited optical luminescence microscopy in GaN

被引:26
作者
Martinez-Criado, G.
Alen, B.
Homs, A.
Somogyi, A.
Miskys, C.
Susini, J.
Pereira-Lachataignerais, J.
Martinez-Pastor, J.
机构
[1] European Synchrotron Radiat Facil, F-38043 Grenoble, France
[2] CSIC, CNM, Microelect Inst Madrid, Tres Cantos 28760, Spain
[3] CSIC, Chem & Environm Res Inst, E-08034 Barcelona, Spain
[4] Univ Valencia, Inst Sci Mat, E-46100 Burjassot, Spain
关键词
SYNCHROTRON-RADIATION; DOPED GAN; PHOTOLUMINESCENCE; ALPHA-AL2O3; ACCEPTOR;
D O I
10.1063/1.2399363
中图分类号
O59 [应用物理学];
学科分类号
摘要
In this work, an imaging tool to investigate optical inhomogeneities with site and chemical sensitivities has been integrated in a hard x-ray microprobe. Freestanding GaN and epitaxially grown GaN:Mn on alpha-Al2O3 are used to exploit the unprecedented scanning x-ray excited luminescence technique. Optical images of the radiative recombination channels are reported for several impurities and defect centers in sapphire and GaN compounds. Within the experimental accuracy, a visible nonuniformity characterizes the Mn centers in good correlation with former x-ray fluorescence map. Expanding the microprobe versatility, x-ray absorption spectroscopy in both photon collection modes (x-ray excited luminescence and x-ray fluorescence) is finally presented from a freestanding GaN layer.
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页数:3
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