GaN HEMT on Si substrate with diamond heat spreader for high power applications

被引:9
|
作者
Arivazhagan, L. [1 ]
Jarndal, Anwar [2 ]
Nirmal, D. [1 ]
机构
[1] Karunya Inst Technol & Sci, Dept Elect & Commun Engn, Coimbatore, Tamil Nadu, India
[2] Univ Sharjah, Dept Elect Engn, Sharjah, U Arab Emirates
关键词
GaN HEMT; Si substrate; SiC substrate; Diamond heat spreader; Self-heating; CURRENT COLLAPSE; ALGAN/GAN HEMTS; FIELD PLATES; GATE-LAG; IMPROVEMENT; BUFFER; TRAPS; DC;
D O I
10.1007/s10825-020-01646-8
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Currently, the GaN-on-silicon high electron mobility transistor (HEMT) is a promising candidate to replace the Si Metal Oxide Semiconductor Field Effect Transistor (MOSFET) for high power electronics circuits. However, self-heating is still a challenging issue to be addressed, especially for high-current applications. In this paper, a GaN-on-Si HEMT with a diamond (Dia) heat spreader is proposed to suppress the self-heating effect. The performance of the proposed device is analyzed and compared with conventional GaN-on-Si and also GaN-on-SiC devices. The analysis was carried-out using technology computer aided design. The GaN-on-Si with diamond heat spreader suppresses the self-heating in the device and achieves higher saturation drain current than conventional GaN-on-Si. In addition, GaN-on-Si with Diamond heat spreader yields a higher transconductance and cut-off frequency than GaN-on-Si. This improved structure will provide a low cost device with enhanced thermal characteristics for higher power applications.
引用
收藏
页码:873 / 882
页数:10
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