Breath figure lithography: A facile and versatile method for micropatterning

被引:36
作者
Li, Lei [1 ]
Zhong, Yawen [1 ]
Li, Jian [1 ]
Gong, Jianliang [1 ]
Ben, Yi [2 ]
Xu, Jin [1 ]
Chen, Xiaping [3 ]
Ma, Zhi [4 ]
机构
[1] Xiamen Univ, Coll Mat, Xiamen 361005, Peoples R China
[2] Xiamen Univ, Anal & Test Ctr, Xiamen 361005, Peoples R China
[3] Xiamen Univ, Coll Phys, Xiamen 361005, Peoples R China
[4] Chinese Acad Sci, Shanghai Inst Organ Chem, Shanghai 200032, Peoples R China
基金
中国国家自然科学基金;
关键词
Block copolymer; Lithography; Reactive ions etching; SELF-ASSEMBLED MONOLAYERS; SOFT LITHOGRAPHY; PATTERN-TRANSFER; FILMS; MORPHOLOGY; IRRADIATION; COPOLYMERS; TEMPLATES; POLYMERS; ARRAYS;
D O I
10.1016/j.jcis.2009.10.005
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We describe a facile method to micropattern solid substrates: breath figure lithography (BFL). A honeycomb structured gold mask was prepared by sputter-coating a micro-porous polymer film with BF arrays, and then inductively coupled plasma reactive ion etching (ICP-RIE) transferred the patterns onto silicon wafer. The large etching rate selectivity between golden mask and substrate plays an important role in the effective transfer of the patterns. The versatility of the method was demonstrated by forming micropatterns on various solid substrates with adjustable sizes. Furthermore, the micropatterns on solid substrate could be replicated by PDMS stamp. (C) 2009 Elsevier Inc. All rights reserved.
引用
收藏
页码:192 / 197
页数:6
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