Dependence of texture development on thickness of single-annealed-layer in sol-gel derived PZT thin films

被引:24
作者
Meng, XJ [1 ]
Cheng, JG [1 ]
Sun, JL [1 ]
Tan, J [1 ]
Ye, HJ [1 ]
Chu, JH [1 ]
机构
[1] Chinese Acad Sci, Shanghai Inst Tech Phys, Natl Lab Infrared Phys, Shanghai 200083, Peoples R China
基金
中国国家自然科学基金;
关键词
annealing; ferroelectric properties; nucleation; X-ray diffraction;
D O I
10.1016/S0040-6090(00)00714-8
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
PbZr0.5Ti0.5O3 thin films have been prepared on Pt (111)/Ti/SiO2/Si substrates by a modified sol-gel technique. The PZT films were annealed layer by layer using a rapid thermal annealing (RTA) method during the spin-coating process. A novel route was used to obtain PZT films with different single-annealed-layer in thickness from the same precursor solution. It is found that the degree of (111) orientation of the films increases with the reduction thickness of single-annealed-layer. As the thickness of single-annealed-layer drops to 40 nm, the film shows a high degree of (111) preferred orientation. The decrease of single-annealed-layer thickness also leads to the increase of the remanent polarization and the dielectric constant. (C) 2000 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:22 / 25
页数:4
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