Photochemical Surface Modification of Silicone Rubber into Photoluminescent Material by 193 nm ArF Excimer Laser Irradiation

被引：9
|
作者：
Okoshi, Masayuki [1 ]
Iyono, Minako [1 ]
Inoue, Narumi [1 ]
机构：
[1] Natl Def Acad, Dept Elect & Elect Engn, Kanagawa 2398686, Japan
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS | 2009年 / 48卷 / 10期
关键词：
F-2; LASER; SIO2; LUMINESCENCE; FABRICATION; EMISSION; FILMS; GLASS;
D O I：
10.1143/JJAP.48.102301
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
A transparent, flexible silicone rubber ([SiO(CH(3))(2)](n)) surface was photochemically modified into a photoluminescent material using a 193 nm ArF excimer laser. The photomodified silicone rubber emitted white light under a 325 nm He-Cd laser or a 375 nm light-emitting diode. The chemical bonding of the photomodified silicone rubber was found to be similar to that of a silica-like silicone, as analyzed by Fourier transform infrared spectroscopy and X-ray photoelectron spectroscopy. The photoluminescence of the rubber originated from oxygen deficiency centers and preoxy centers of the silica structure in the photomodified silicone rubber. Fine particles 200 nm in diameter were also formed in the photomodified silicone rubber to enhance the insensity of the photoluminescence. (C) 2009 The Japan Society of Applied Physics
引用
收藏
页码：1023011 / 1023017
页数：7
相关论文
共 50 条
  • [21] The contribution of aqueous humor in ArF 193 nm excimer laser photorefractive keratectomy
    不详
    EUROPEAN BIOPHYSICS JOURNAL WITH BIOPHYSICS LETTERS, 2005, 34 (06): : 764 - 764
  • [22] CONDITIONING OF ENAMEL SURFACES USING AN 193 NM ARF EXCIMER-LASER
    FRENTZEN, M
    GAIDES, T
    WINEKSTRATER, C
    VANBENTHEM, H
    KOORT, HJ
    JOURNAL OF DENTAL RESEARCH, 1995, 74 (03) : 920 - 920
  • [23] THE TREATMENT OF DENTAL HARD SUBSTANCE SURFACES WITH A 193 NM ARF EXCIMER LASER
    FRENTZEN, M
    KOORT, HJ
    KERMANI, O
    DARDENNE, MU
    DEUTSCHE ZAHNARZTLICHE ZEITSCHRIFT, 1989, 44 (06): : 454 - 457
  • [24] Wavelength Dependence of Photochemical Surface Modification of Silicone Rubber
    Okoshi, Masayuki
    Iyono, Minako
    Inoue, Narumi
    Yamashita, Tsugito
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2009, 54 (03) : 1203 - 1206
  • [25] PHOTOCHEMICAL MODIFICATION OF POLYTETRAFLUOROETHYLENE INTO OLEOPHILIC PROPERTY USING AN ARF EXCIMER LASER
    OKOSHI, M
    MURAHARA, M
    TOYODA, K
    JOURNAL OF MATERIALS RESEARCH, 1992, 7 (07) : 1912 - 1916
  • [26] Surface morphology and sub-surface damaged layer of various glasses machined by 193 nm ArF excimer laser
    Liao, YS
    Chen, YT
    Chao, CL
    Liu, YM
    Micromachining and Microfabrication Process Technology X, 2005, 5715 : 110 - 117
  • [27] Surface modification of a MoSiON phase shift mask to reduce critical dimension variation after exposure to a 193-nm ArF excimer laser
    Choo, Hyeokseong
    Seo, Dongwan
    Lim, Sangwoo
    APPLIED SURFACE SCIENCE, 2014, 311 : 831 - 836
  • [28] Evolution of local surface roughness in 193 nm ArF excimer laser ablation of ground Yb:YAG crystal
    Shao, Jingzhen
    Liang, Xu
    Lin, Ying
    Shen, Qihui
    Ren, Jiacheng
    Zhang, Qingli
    JOURNAL OF THE OPTICAL SOCIETY OF AMERICA B-OPTICAL PHYSICS, 2023, 40 (08) : 2183 - 2190
  • [29] Human corneal ablation threshold using the 193-nm ArF excimer laser
    Berns, MW
    Chao, L
    Giebel, AW
    Liaw, LH
    Andrews, J
    VerSteeg, B
    INVESTIGATIVE OPHTHALMOLOGY & VISUAL SCIENCE, 1999, 40 (05) : 826 - 830
  • [30] CLINICAL FOLLOW-UP OF 193-NM ARF EXCIMER LASER PHOTOKERATECTOMY
    STARK, WJ
    CHAMON, W
    KAMP, MT
    ENGER, CL
    RENCS, EV
    GOTTSH, JD
    OPHTHALMOLOGY, 1992, 99 (05) : 805 - 812
12345