One-Step Direct-Patterning Template Utilizing Self-Assembly of POSS-Containing Block Copolymers

被引：162

作者：

Hirai, Tomoyasu ^{[1
]}

Leolukman, Melvina ^{[3
]}

Liu, Chi Chun ^{[2
]}

Han, Eungnak ^{[3
]}

Kim, Yun Jun ^{[3
]}

Ishida, Yoshihito ^{[1
]}

Hayakawa, Teruaki ^{[1
]}

Kakimoto, Masa-aki ^{[1
]}

Nealey, Paul F. ^{[2
]}

Gopalan, Padma ^{[3
]}

机构：

[1] Tokyo Inst Technol, Dept Organ & Polymer Mat, Eguro Ku, Tokyo 1528552, Japan

[2] Univ Wisconsin, Dept Chem & Biol Engn, Madison, WI 53706 USA

[3] Univ Wisconsin, Dept Mat Sci & Engn, Madison, WI 53706 USA

来源：

ADVANCED MATERIALS | 2009年 / 21卷 / 43期

基金：

美国国家科学基金会;

关键词：

THIN-FILMS; LITHOGRAPHY; FABRICATION; RESISTS; MEDIA; NM;

D O I：

10.1002/adma.200900518

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

We report the self-assembly of organic-inorganic block copolymers (BCP) in thin-films by simple solvent annealing on unmodified substrates. The resulting vertically oriented lamellae and cylinders are converted to a hard silica mask by single-step, highly selective oxygen plasma etching. The size of the resulting nanostructures in the case of cylinders is less than 10 nm.

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收藏

页码：4334 / +

页数：6

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