Effect of Nanostructure on High Temperature Tensile Strength of Amorphous SiCN Ceramics: A Large-Scale Molecular Dynamics Study

被引：1
作者：
Liao, Ningbo [1 ]
Zheng, Beirong [1 ]
Qu, Jianwu [1 ]
Xue, Wei [1 ]
机构：
[1] Wenzhou Univ, Coll Mech & Elect Engn, Wenzhou 325035, Peoples R China
来源：
SCIENCE OF ADVANCED MATERIALS | 2015年 / 7卷 / 12期
基金：
中国国家自然科学基金;
关键词：
Molecular Dynamics; Barrier Layer Material; Free Carbon; Nano-Domain; SiCN; POLYMER-DERIVED CERAMICS; MECHANICAL-PROPERTIES; C-N; SILICON;
D O I：
10.1166/sam.2015.2426
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
In this study, atomistic simulations were applied to study the mechanical properties of SiCN at high temperature tensile strain. The atomistic structures obtained by large-scale molecular dynamics simulations agree with current experimental results, and provide more details on high temperature mechanical properties of SiCN. The interface of Si3N4 region and free carbon in SiCN is not the unique location of fracture, which means that the domain interfaces in SiCN are strong. Si3C7N4 presents the largest Young's modulus at all temperatures, which is attributed to the network structure of free carbon. The three-dimensional free carbon network results in stable Young's modulus at high temperatures, and it gives an explanation for excellent thermal stability of SiCN.
引用
收藏
页码：2503 / 2507
页数：5
相关论文
共 27 条
  • [1] Structural and mechanical properties of amorphous silicon carbonitride films prepared by vapor-transport chemical vapor deposition
    Awad, Y.
    El Khakani, M. A.
    Aktik, C.
    Mouine, J.
    Camire, N.
    Lessard, M.
    Scarlete, M.
    Al-Abadleh, H. A.
    Smirani, R.
    [J]. SURFACE & COATINGS TECHNOLOGY, 2009, 204 (04) : 539 - 545
  • [2] Structural characterization of amorphous SiCxNy chemical vapor deposited coatings
    Bendeddouche, A
    Berjoan, R
    Beche, E
    MerleMejean, T
    Schamm, S
    Serin, V
    Taillades, G
    Pradel, A
    Hillel, R
    [J]. JOURNAL OF APPLIED PHYSICS, 1997, 81 (09) : 6147 - 6154
  • [3] Electrical and reliability performances of nitrogen-incorporated silicon carbide dielectric by chemical vapor deposition
    Cheng, Yi-Lung
    Chen, Shiuan-An
    Chiu, Tai-Jung
    Wu, Jiung
    Wei, Bor-Jou
    Chang, Hung-Jui
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2010, 28 (03): : 573 - 576
  • [4] Cross T, 2006, J AM CERAM SOC, V89, P3706, DOI [10.1111/j.1551-2916.2006.01291.x, 10.1111/j.1551-2916.2006.0129i.x]
  • [5] Molecular dynamics simulation of elastic properties of CuPd nanowire
    Davoodi, Jamal
    Ahmadi, Maryam
    [J]. COMPOSITES PART B-ENGINEERING, 2012, 43 (01) : 10 - 14
  • [6] Structural properties of amorphous silicon nitride
    de Brito Mota, F
    Justo, JF
    Fazzio, A
    [J]. PHYSICAL REVIEW B, 1998, 58 (13): : 8323 - 8328
  • [7] Nanoindentation of a polymer-derived amorphous silicon carbonitride ceramic
    Galusek, D
    Riley, FL
    Riedel, R
    [J]. JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 2001, 84 (05) : 1164 - 1166
  • [8] Young's modulus of silicon nitride used in scanning force microscope cantilevers
    Khan, A
    Philip, J
    Hess, P
    [J]. JOURNAL OF APPLIED PHYSICS, 2004, 95 (04) : 1667 - 1672
  • [9] SiOC ceramic with high excess free carbon
    Kleebe, Hans-Joachim
    Blum, Yigal D.
    [J]. JOURNAL OF THE EUROPEAN CERAMIC SOCIETY, 2008, 28 (05) : 1037 - 1042
  • [10] Thermal stability of SiCN ceramics studied by spectroscopy and electron microscopy
    Kleebe, HJ
    Störmer, H
    Trassl, S
    Ziegler, G
    [J]. APPLIED ORGANOMETALLIC CHEMISTRY, 2001, 15 (10) : 858 - 866
123