Photosensitive phosphazene substrates: Synthesis and characterization

被引：0
|
作者：
Fantin, G
Fogagnolo, M
Medici, A
Pedrini, P
Gleria, M
Minto, F
机构：
[1] UNIV FERRARA,DIPARTIMENTO CHIM,I-44100 FERRARA,ITALY
[2] IST FOTOCHIM & RADIAZ ALTA ENERGIA,SEZ LEGNARO,I-35020 LEGNARO,PADOVA,ITALY
来源：
GAZZETTA CHIMICA ITALIANA | 1997年 / 127卷 / 05期
关键词：
D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
The synthesis and the characterization of new cyclic and polymeric phosphazenes with interesting applicative potential in the photochemical domain is reported. In particular, cyclic and polyphosphazene derivatives containing 4-tert-butoxycarbonyloxyphenoxy (BOC) residues (5a-b), cyclophosphazenes substituted with alpha,alpha'-dialkoxyacetophenone groups (6a-c) and bearing tertiary amines as side phosphorus substituents (7a-b, 9a-b, 12 and 13) are described.
引用
收藏
页码：287 / 292
页数：6
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