A new method for cleaning the surface of ultra high-purity iron by high-purity ozone exposure and UV irradiation

被引：6

作者：

Suzuki, S ^{[1
]}

Ichimura, S ^{[1
]}

Kurokawa, A ^{[1
]}

Ishikawa, Y ^{[1
]}

Isshiki, M ^{[1
]}

Waseda, Y ^{[1
]}

机构：

[1] ELECTROTECH LAB,TSUKUBA,IBARAKI 305,JAPAN

来源：

MATERIALS TRANSACTIONS JIM | 1997年 / 38卷 / 05期

关键词：

ozone; ultra high-purity iron; surface cleaning; oxidation; X-ray photoelectron spectroscopy;

D O I：

10.2320/matertrans1989.38.451

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A new method by applying high-purity ozone exposure and ultraviolet (UV) irradiation has been used for cleaning the surface of ultra high-purity iron with a carbon contaminated layer. The amount and chemical state of elements on the specimen surface were characterized by X-ray photoelectron spectroscopy. The intensity of the C 1s XPS peak due to carbon contamination was found to decrease with increasing ozone exposure al room temperature. UV irradiation during ozone exposure enhanced the cleaning rare. The XPS results show that contaminated carbon is mainly classified into major aliphatic carbon and minor carboxyl carbon, and their ratio depends upon the condition of ozone exposure. The role of ozone exposure and UV irradiation was discussed with respect to surface cleaning.

引用

页码：451 / 456

页数：6

共 18 条

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[2]

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[3]

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