The adsorption of alcohols on hydroxylated Si(100)-2x1

被引:36
作者
Bitzer, T [1 ]
Richardson, NV [1 ]
Schiffrin, DJ [1 ]
机构
[1] UNIV LIVERPOOL,DEPT CHEM,LIVERPOOL L69 3BX,MERSEYSIDE,ENGLAND
基金
英国工程与自然科学研究理事会;
关键词
alcohols; chemisorption; electron energy loss spectroscopy; silicon; single crystal surfaces;
D O I
10.1016/S0039-6028(97)00166-0
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The adsorption of ethanol, isopropanol and tert-butanol on clean and H2O pre-dosed Si(100)-2 x 1 has been studied by high resolution electron energy loss spectroscopy (HREELS). We observe that the reactivity of the alcohols towards Sii 100)-2 x 1 pre saturated with H2O decreases with increasing number of methyl groups in the series (CH3)nCH(3-n)OH (n=1, 2, 3). All alcohols chemisorb on the silicon substrates via a deprotonation of the OH group with the formation of alkoxy and silicon hydride species. In the case of H2O saturated Si(100)-2 x 1. the adsorption involves cleavage of the Si-Si bond of the silicon surface dimer. (C) 1997 Elsevier Science B.V.
引用
收藏
页码:L686 / L689
页数:4
相关论文
共 11 条
[1]   INSITU OBSERVATION OF WATER-ADSORPTION ON SI(100) WITH SCANNING TUNNELING MICROSCOPY [J].
ANDERSOHN, L ;
KOHLER, U .
SURFACE SCIENCE, 1993, 284 (1-2) :77-90
[2]   INFRARED SPECTRA OF VANADIUM SURFACE COMPLEXES FORMED WITH OXYGEN-CONTAINING MOLECULES [J].
BLYHOLDE.G ;
ALLEN, MC .
INORGANIC CHEMISTRY, 1970, 9 (02) :302-&
[3]   INHIBITION OF PYRAMID FORMATION IN THE ETCHING OF SI P[100] IN AQUEOUS POTASSIUM HYDROXIDE-ISOPROPANOL [J].
CAMPBELL, SA ;
COOPER, K ;
DIXON, L ;
EARWAKER, R ;
PORT, SN ;
SCHIFFRIN, DJ .
JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 1995, 5 (03) :209-218
[4]  
DATTA M, 1989, J ELECTROCHEM SOC, V136, P285
[5]  
EDAMOTO K, 1984, SURF SCI, V146, pL533, DOI 10.1016/0039-6028(84)90216-4
[6]  
Ibach H., 1982, ELECT ENERGY LOSS SP
[7]   ETUDE PAR SPECTROSCOPIE INFRAROUGE DE COMPOSES ORGANOSILICIES .2. SILOXANES, SILAZANES, AMINO- ET DIAMINOSILANES [J].
MARCHAND, A ;
FOREL, MT ;
METRAS, F ;
VALADE, J .
JOURNAL DE CHIMIE PHYSIQUE ET DE PHYSICO-CHIMIE BIOLOGIQUE, 1964, 61 (03) :343-362
[8]   ADSORPTION OF WATER ON A CYLINDRICAL SILICON CRYSTAL [J].
RANKE, W ;
SCHMEISSER, D .
SURFACE SCIENCE, 1985, 149 (2-3) :485-499
[9]   ADSORPTION OF H,O, AND H2O AT SI(100) AND SI(111) SURFACES IN THE MONOLAYER RANGE - A COMBINED EELS, LEED, AND XPS STUDY [J].
SCHAEFER, JA ;
STUCKI, F ;
FRANKEL, DJ ;
GOPEL, W ;
LAPEYRE, GJ .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1984, 2 (03) :359-365
[10]   LOCALIZED FABRICATION OF SI NANOSTRUCTURES BY FOCUSED ION-BEAM IMPLANTATION [J].
STECKL, AJ ;
MOGUL, HC ;
MOGREN, S .
APPLIED PHYSICS LETTERS, 1992, 60 (15) :1833-1835