Coercivity enhancement in sputtered Pr-Fe-B/FeMn thin films

被引：9
作者：
Yang, F.
Wang, X.
Liu, W. [1 ]
Liu, X. H.
Liu, X. G.
Zhao, X. G.
Zhang, Z. D.
机构：
[1] Chinese Acad Sci, Shenyang Natl Lab Mat Sci, Inst Met Res, Shenyang 110016, Peoples R China
来源：
JOURNAL OF ALLOYS AND COMPOUNDS | 2009年 / 485卷 / 1-2期
基金：
中国国家自然科学基金;
关键词：
Perpendicular anisotropy; Thin films; FeMn film; Coercivity enhancement; Sputtering; PERPENDICULAR MAGNETIC-ANISOTROPY; EXCHANGE-BIAS; PERMANENT-MAGNETS;
D O I：
10.1016/j.jallcom.2009.06.074
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Pr-Fe-B/Mo/FeMn/Mo/Pr-Fe-B thin films were deposited by magnetron sputtering on Si(1 0 0)substrates heated at 650 degrees C. The coercivity of these films is obviously enhanced in comparison with that of Pr-Fe-B films. which may be due to the interfacial ferromagnetic (FM)-antiferromagnetic (AFM) exchange interaction and the change in microstructure The maximum energy product (BH)(max) of these films call also be improved by tuning the FM/AFM thickness ratio. The magnetic properties of the films vary with the thicknesses of Pr-Fe-B and FeMn layers. (C) 2009 Elsevier B.V. All rights reserved.
引用
收藏
页码：33 / 35
页数：3
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