Development of MoSi2 coating on Nb-1Zr-0.1C alloy

被引：12

作者：

Majumdar, S. ^{[1
]}

Mishra, S. C. ^{[1
]}

Paul, B. ^{[1
]}

Kishor, J. ^{[1
]}

Mishra, P. ^{[1
]}

Chakravartty, J. K. ^{[2
]}

机构：

[1] Bhabha Atom Res Ctr, Mat Proc Div, Bombay 400085, Maharashtra, India

[2] Bhabha Atom Res Ctr, Mat Grp, Bombay 400085, Maharashtra, India

来源：

MATERIALS TODAY-PROCEEDINGS | 2016年 / 3卷 / 09期

关键词：

Molybdenum di-silicide; Oxidation; Niobium; Coating; Diffusion; DIFFUSION; MO; NB; INTERDIFFUSION; PHASES; SYSTEM;

D O I：

10.1016/j.matpr.2016.09.034

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

MoSi2 coating has been developed on Nb-1Zr-0.1C alloy surface by firstly depositing Mo using magnetron sputtering technique and subsequent Si deposition by a chemical vapor deposition process namely pack siliconizing. About 2 mu m thick interdiffusion zone is formed after annealing the Mo-coated Nb-alloy at 1500 degrees C. The detailed characterization studies using XRF, SEM, EDS and EBSD of the pack siliconized coated alloy revealed the formation of an outer MoSi2 layer and an inner NbSi2 layer. About 25 mu m thick MoSi2 layer comprising of fine grained microstructure is formed at 1100 degrees C. (C) 2015 Elsevier Ltd. All rights reserved.

引用

页码：3172 / 3177

页数：6

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