Tuning Electrodeposition Conditions towards the Formation of Smooth Bi2Se3 Thin Films

被引:21
作者
Souza, Paloma B. [1 ]
Tumelero, Milton A. [1 ,2 ]
Zangari, Giovanni [3 ]
Pasa, Andre A. [1 ]
机构
[1] Univ Fed Santa Catarina, Dept Fis, BR-88 04090 Florianopolis, SC, Brazil
[2] Univ Fed Rio Grande do Sul, Inst Fis, Caixa Postal 15051, BR-91501970 Porto Alegre, RS, Brazil
[3] Univ Virginia, Dept Mat Sci & Engn, Charlottesville, VA 22904 USA
关键词
TOPOLOGICAL INSULATORS; GROWTH; SB2TE3; POWER;
D O I
10.1149/2.0531707jes
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Bismuth selenide (Bi2Se3) is a semiconductor presenting two distinct crystalline phases with distinct bandgap and interesting optical, thermoelectric and topological electronic properties. In this work, thin films were grown by electrodeposition under constant potential onto silicon (100) substrate. It is shown that under an optimum set of deposition parameters, very smooth and thick films can be obtained. Such smoothness of the samples is highly desirable for future devices applications. Structural characterization of the samples indicates a majority of a metastable orthorhombic phase, while successively traces of rhombohedral and amorphous phases were detected. On the other hand, morphological characterization evidences the formation of compact, uniform and smooth layers. A full recrystallization to the rhombohedral structure can be achieved by using short time and low temperature thermal treatments. (C) 2017 The Electrochemical Society. All rights reserved.
引用
收藏
页码:D401 / D405
页数:5
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