机构:
Tech Univ Munich, Walter Schottky Inst, D-85748 Garching, GermanyTech Univ Munich, Walter Schottky Inst, D-85748 Garching, Germany
Koynov, Svetoslav
[1
]
Brandt, Martin S.
论文数: 0引用数: 0
h-index: 0
机构:
Tech Univ Munich, Walter Schottky Inst, D-85748 Garching, GermanyTech Univ Munich, Walter Schottky Inst, D-85748 Garching, Germany
Brandt, Martin S.
[1
]
Stutzmann, Martin
论文数: 0引用数: 0
h-index: 0
机构:
Tech Univ Munich, Walter Schottky Inst, D-85748 Garching, GermanyTech Univ Munich, Walter Schottky Inst, D-85748 Garching, Germany
Stutzmann, Martin
[1
]
机构:
[1] Tech Univ Munich, Walter Schottky Inst, D-85748 Garching, Germany
来源:
PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS
|
2007年
/
1卷
/
02期
关键词:
D O I:
10.1002/pssr.200600064
中图分类号:
T [工业技术];
学科分类号:
08 ;
摘要:
A simple method for nano-scale texturing of silicon surfaces based on local metal-catalyzed wet chemical etching, which results in an almost complete suppression of reflectivity in a broad spectral range, has been successfully applied to produce black multi-crystalline silicon solar cells. The performance of the cells is compared to that of reference cells without surface nano-texturing. A considerable increase of the short circuit current (by 36-42% with respect to the reference cells) without deterioration of other performance parameters is observed under natural sun illumination. Means of further optimization of such black solar cells are discussed.