Correlation of Microstructural and Mechanical Properties of CVD Deposited TiAIN Coatings

被引：10

作者：

Das, Soham ^{[1
]}

Ghadai, Ranjan ^{[1
]}

Guha, Spandan ^{[2
]}

Sharma, Ashis ^{[1
]}

Swain, Bibhu P. ^{[3
]}

机构：

[1] Sikkim Manipal Inst Technol, Dept Mech Engn, Majitar 737136, Rangpo East Sik, India

[2] Kalinga Inst Ind Technol Bhubaneswar, Sch Mech Engn, Bhubaneswar 751024, India

[3] Natl Inst Technol, Dept Phys, Imphal 795004, Manipur, India

来源：

ARABIAN JOURNAL FOR SCIENCE AND ENGINEERING | 2020年 / 45卷 / 02期

关键词：

TiAIN; APCVD; FESEM; XRD; AFM; NITROGEN FLOW-RATES; THERMAL-STABILITY; GROWTH-MORPHOLOGY; ADHESION; ALUMINUM; TIN;

D O I：

10.1007/s13369-019-04202-0

中图分类号：

O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];

学科分类号：

07 ; 0710 ; 09 ;

摘要：

Titanium aluminum nitride (TiAlN) thin films were synthesized with different N-2 flow rate on p-type Si (100) substrate and characterized by FESEM, AFM, XRD and nanoindentation to investigate the morphology, structural and mechanical properties. The FESEM images revealed non-uniform grain distribution with a higher degree of pores with the increase in N-2 flow rate. The XRD data indicated the presence of AlN, TiAlN, Al2O3 dominant phases at 33.07 degrees, 55.5 degrees, 61.79 degrees and 47.84 degrees, 54.67 degrees diffraction angles attributed to (100), (220) and (400), (112) diffraction plane, respectively. The AFM images revealed the average roughness as 36.9 nm for 30 sccm N-2 flow rate. Furthermore, the mechanical properties such as H, E, plasticity index (H/E) and deformation to plastic resistance (H-3/E-2) of TiAlN thin film were found to be 21 GPa, 400 GPa, 0.094 and 0.318 GPa, respectively, indicating higher resistance to crack with increasing N-2 flow rate.

引用

页码：967 / 975

页数：9

共 35 条

[1] Tribological and mechanical properties of Ti/TiAlN/TiAlCN nanoscale multilayer PVD coatings deposited on AISI H11 hot work tool steel [J].

AL-Bukhaiti, M. A. ;

Al-hatab, K. A. ;

Tillmann, W. ;

Hoffmann, F. ;

Sprute, T. .

APPLIED SURFACE SCIENCE, 2014, 318 :180-190

[2] Multilayer (TiN, TiAlN) ceramic coatings for nuclear fuel cladding [J].

Alat, Ece ;

Motta, Arthur T. ;

Comstock, Robert J. ;

Partezana, Jonna M. ;

Wolfe, Douglas E. .

JOURNAL OF NUCLEAR MATERIALS, 2016, 478 :236-244

[3] Electrochemical corrosion and materials properties of reactively sputtered TiN/TiAlN multilayer coatings [J].

Ananthakumar, R. ;

Subramanian, B. ;

Kobayashi, Akira ;

Jayachandran, M. .

CERAMICS INTERNATIONAL, 2012, 38 (01) :477-485

[4] The effect of titanium current on structure and hardness of aluminium titanium nitride deposited by reactive unbalanced magnetron co-sputtering [J].

Buranawong, A. ;

Witit-anun, N. ;

Chaiyakun, S. ;

Pokaipisit, A. ;

Limsuwan, P. .

THIN SOLID FILMS, 2011, 519 (15) :4963-4968

[5]

Camps E., 2015, J MAT SCI ENG B, V5, P331, DOI 10.17265/21616221/2015.78.012

[6] Effect of N2 Flow rates on Properties of Nanostructured TiAlN Thin Films Prepared by Reactive Magnetron Co-Sputtering [J].

Chaiyakun, Surasing ;

Somwangsakul, Areerat ;

Buranawong, Adisorn ;

Kaewkhao, Jakrapong ;

Witit-anun, Nirun .

APPLIED PHYSICS AND MATERIAL APPLICATIONS, 2013, 770 :161-+

[7] Effects of nitrogen flow rates on the growth morphology of TiA1N films prepared by an rf-reactive sputtering technique [J].

Chakrabarti, K ;

Jeong, JJ ;

Hwang, SK ;

Yoo, YC ;

Lee, CM .

THIN SOLID FILMS, 2002, 406 (1-2) :159-163

[8] Effects of normal load on nanotribological properties of sputtered carbon nitride films [J].

Charitidis, CA ;

Logothetidis, S .

[9]

Chokwatvikul C, 2011, J MET MATER MINER, V21, P115

[10] Structural and mechanical properties of CVD deposited titanium aluminium nitride (TiAlN) thin films [J].

Das, Soham ;

Guha, Spandan ;

Ghadai, Ranjan ;

Kumar, Dhruva ;

Swain, Bibhu P. .

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2017, 123 (06)

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