Nanometer-scale pores in low-k dielectric films probed by positron annihilation lifetime spectroscopy

被引:33
|
作者
Wang, CL [1 ]
Weber, MH
Lynn, KG
Rodbell, KP
机构
[1] Washington State Univ, Dept Phys, Pullman, WA 99164 USA
[2] IBM Corp, Thomas J Watson Res Ctr, Yorktown Hts, NY 10598 USA
关键词
D O I
10.1063/1.1526923
中图分类号
O59 [应用物理学];
学科分类号
摘要
We measured positron annihilation lifetime spectra in mesoporous low dielectric constant (low-k) methyl-silsesquioxane (MSSQ) films versus porogen load Phi from Phi=0% to 50%. The ortho-positronium lifetime parameters were obtained using both the maximum entropy and discrete lifetime analyses. Open and closed porosity distributions and the average radius of closed pores were obtained. The total porosity and the fraction of open/closed porosities were evaluated. The total porosity increases linearly with porogen load, consistent with the porosity obtained from density measurements. Open porosity occurs from 20% porogen load upwards. (C) 2002 American Institute of Physics.
引用
收藏
页码:4413 / 4415
页数:3
相关论文
共 50 条
  • [1] Future directions of positron annihilation spectroscopy in low-k dielectric films
    Gidley, D. W.
    Vallery, R. S.
    Liu, M.
    Peng, H. -G.
    PHYSICA STATUS SOLIDI C - CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 4, NO 10, 2007, 4 (10): : 3796 - +
  • [2] Nanometer-scale voids in PECVD silicon-oxide films probed by variable-energy positron lifetime spectroscopy: A comparison with infrared spectroscopy
    Wang, CL
    Kobayashi, Y
    Hirata, K
    Suzuki, R
    Ohdaira, T
    Mikado, T
    RADIATION PHYSICS AND CHEMISTRY, 2001, 60 (4-5) : 545 - 549
  • [3] Pore-connectivity dependence of moisture absorption into porous low-k films by positron-annihilation lifetime spectroscopy
    Ito, Fuminori
    Takeuchi, Tsuneo
    Yamamoto, Hironori
    Ohdaira, Toshiyuki
    Suzuki, Ryoichi
    Hayashi, Yoshihiro
    ADVANCED METALLIZATION CONFERENCE 2007 (AMC 2007), 2008, 23 : 465 - 470
  • [4] Probing diffusion barrier integrity on porous silica low-k thin films using positron annihilation lifetime spectroscopy
    Sun, JN
    Gidley, DW
    Dull, TL
    Frieze, WE
    Yee, AF
    Ryan, ET
    Lin, S
    Wetzel, J
    JOURNAL OF APPLIED PHYSICS, 2001, 89 (09) : 5138 - 5144
  • [5] Positronium annihilation lifetime spectroscopy of porous low-k films with periodic pore structures
    Ohdaira, T
    Suzuki, R
    Shirataki, H
    Matsuno, SY
    POSITRON ANNIHILATION, ICPA-13, PROCEEDINGS, 2004, 445-6 : 334 - 336
  • [6] Relaxation behavior of polymers probed by positron annihilation lifetime spectroscopy
    Suzuki, T
    He, CQ
    Shantarovich, V
    Kondo, K
    Ito, Y
    Ma, L
    Matsuo, M
    MATERIALS RESEARCH INNOVATIONS, 2003, 7 (01) : 31 - 36
  • [7] Positron Annihilation Lifetime Spectroscopy (PALS) application in metal barrier layer integrity for porous low-k materials
    Lin, S
    Sun, JN
    Gidley, DW
    Wetzel, JT
    Monnig, KA
    Ryan, ET
    Jang, S
    Yu, D
    Liang, MS
    MATERIALS ISSUES IN NOVEL SI-BASED TECHNOLOGY, 2002, 686 : 229 - 234
  • [8] Nanovoids in Glasses and Polymers Probed by Positron Annihilation Lifetime Spectroscopy
    Kavetskyy, Taras
    Kolev, Kolyo
    Boev, V.
    Petkov, Plamen
    Petkova, T.
    Stepanov, Andrey L.
    NANOTECHNOLOGICAL BASIS FOR ADVANCED SENSORS, 2010, : 103 - +
  • [9] A discussion of the practical importance of positron annihilation lifetime spectroscopy percolation threshold in evaluation of porous low-K dielectrics
    Mogilnikov, KP
    Baklanov, MR
    Shamiryan, D
    Petkov, MP
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2004, 43 (01): : 247 - 248
  • [10] Characterization of porous silicate low-k films by ellipsometric porosimetry and variable-energy positron annihilation spectroscopy
    Ito, K
    Kobayashi, Y
    Suzuki, R
    Ohdaira, T
    Yu, RS
    Sato, K
    Hirata, K
    Togashi, H
    Egami, M
    Arao, H
    Nakashima, A
    Komatsu, M
    CONTINUOUS NANOPHASE AND NANOSTRUCTURED MATERIALS, 2004, 788 : 397 - 402