Fatigue behavior of nanoscale Mo/W multilayers on flexible substrates

被引：3

作者：

Wang, Fang ^{[1
,2
]}

Luo, Xue-Mei ^{[1
]}

Wang, Dong ^{[3
,4
]}

Schaaf, Peter ^{[3
,4
]}

Zhang, Guang-Ping ^{[1
]}

机构：

[1] Chinese Acad Sci, Shenyang Natl Lab Mat Sci, Inst Met Res, 72 Wenhua Rd, Shenyang 110016, Peoples R China

[2] Univ Sci & Technol China, Sch Mat Sci & Engn, Shenyang 110016, Peoples R China

[3] TU Ilmenau, Inst Mat Engn, Gustav Kirchhoff Str 5, D-98693 Ilmenau, Germany

[4] TU Ilmenau, Inst Micro & Nanotechnol MacroNano, Gustav Kirchhoff Str 5, D-98693 Ilmenau, Germany

来源：

MRS ADVANCES | 2019年 / 4卷 / 43期

基金：

中国国家自然科学基金;

关键词：

HIGH-CYCLE FATIGUE; DAMAGE BEHAVIOR; FILMS; ELECTRONICS; NUCLEATION; RESISTANCE; STRENGTH;

D O I：

10.1557/adv.2019.252

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Fatigue properties of Mo/W multilayers with individual layer thickness (lambda) of 5, 20, 50 and 100 nm on flexible polyimide substrates were investigated. The experimental results show that the fatigue resistance increases with decreasing lambda from 100 nm to 20 nm, and reaches the maximum at lambda =20 nm, and then decreases when further decreasing lambda. Fatigue cracks of Mo/W multilayers with different lambda were found to propagate along columnar grain boundary in the out-of-plane direction and along the boundary of cluster structures. The enhanced fatigue resistance is attributed to the larger cluster inclination angles and the more tortuous in-plane cracking paths.

引用

页码：2309 / 2317

页数：9

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