Scanning tunneling microscopy and spectroscopy of the electronic structure of dislocations in GaN/Si(111) grown by molecular-beam epitaxy

被引:10
作者
Chiu, Ya-Ping [1 ]
Chen, Bo-Chih [1 ]
Huang, Bo-Chao [1 ]
Shih, Min-Chuan [1 ]
Tu, Li-Wei [1 ]
机构
[1] Natl Sun Yat Sen Univ, Dept Phys, Ctr Nanosci & Nanotechnol, Kaohsiung 80424, Taiwan
关键词
conduction bands; electronic structure; gallium compounds; III-V semiconductors; molecular beam epitaxial growth; scanning tunnelling microscopy; scanning tunnelling spectroscopy; semiconductor epitaxial layers; semiconductor growth; surface morphology; valence bands; wide band gap semiconductors; THREADING-EDGE; YELLOW LUMINESCENCE; GAN;
D O I
10.1063/1.3319512
中图分类号
O59 [应用物理学];
学科分类号
摘要
By using cross-sectional scanning tunneling microscopy, a correlation between the surface morphology and the corresponding electronic states of the dislocations terminated at the GaN(1100) cleavage surfaces grown by molecular-beam epitaxy has been demonstrated. Both scanning tunneling spectroscopy and analysis of the dislocations on electronic structures suggest that regions surrounding dislocations register gap states in the fundamental band gap of GaN. Closely examining the recognition of the electronic structure reveals that the defect levels could provide the possibility of yellow luminescence, involving a transition from the conduction-band edge to a level at 1.2 eV above the valence band edge.
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页数:3
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