Simulation of optical lithography process for fabricating diffractive optics

被引：4
|
作者：
Xiao, X [1 ]
Yang, J [1 ]
Du, JL [1 ]
Guo, YK [1 ]
Du, CL [1 ]
机构：
[1] Sichuan Univ, Dept Phys, Chengdu 610064, Peoples R China
来源：
HOLOGRAPHY, DIFFRACTIVE OPTICS, AND APPLICATIONS | 2002年 / 4924卷
关键词：
diffractive optics; deep relief grating; lithography; simulation;
D O I：
10.1117/12.481514
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
Diffractive optics is a rapidly developing branch of optics involved computer generated holography, kinoform technology, microelectronics and microfabrication technology Fabricating some diffractive optics through optical lithography is an effective method. For optimizing lithography process of manufacturing diffractive optics, surface profiles of deep relief gratings are simulated in this paper. Different photoresists are used in the simulations, and simulation results are discussed.
引用
收藏
页码：221 / 227
页数：7
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