Emerging trends in surface metrology

被引：62

作者：

Lonardo, PM ^{[1
]}

Lucca, DA

De Chiffre, L

机构：

[1] Univ Genoa, Genoa, Italy

[2] Oklahoma State Univ, Stillwater, OK 74078 USA

[3] Tech Univ Denmark, DK-2800 Lyngby, Denmark

来源：

CIRP ANNALS-MANUFACTURING TECHNOLOGY | 2002年 / 51卷 / 02期

关键词：

surface; metrology; surface integrity;

D O I：

10.1016/S0007-8506(07)61708-9

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Recent advancements and some emerging trends in the methods and instruments used for surface and near surface characterisation are presented, considering the measurement of both topography and physical properties. In particular, surfaces that present difficulties in measurement or require new procedures are considered, with emphasis on measurements approaching the nanometre scale. Examples of new instruments and promising innovations for roughness measurement and surface integrity characterisation are presented. The new needs for tolerancing, traceability and calibration are also addressed.

引用

页码：701 / 723

页数：23

共 186 条

[1]

ABOUZEID A, 2000, P 1 EUSP TOP C FABR, V1, P137

[2]

Akimova I. V., 1977, Soviet Journal of Quantum Electronics, V7, P765, DOI 10.1070/QE1977v007n06ABEH012893

[3] CORRELATION BETWEEN STRUCTURAL, OPTICAL, AND ELECTRICAL-PROPERTIES OF GAAS GROWN ON (001) SI [J].