共 51 条
[1]
FAST SILICON ETCHING USING AN EXPANDING CASCADE ARC PLASMA IN A SF6/ARGON MIXTURE
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1992, 10 (06)
:2387-2392
[2]
Biagi SF, 2012, BIAGI DATABASE
[4]
Brussaard G. J. H., 1999, THESIS EINDHOVEN U T
[5]
Stripping of photoresist using a remote thermal Ar/O2 and Ar/N2/O2 plasma
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
2003, 21 (01)
:61-66