Chemical solution. deposition and transport properties of Ag-doped manganite films

被引:1
|
作者
Zhu, Xuebin [1 ]
Sun, Yuping [1 ]
Lei, Hechang [1 ]
Li, Xianghu [1 ]
Song, Wenhai [1 ]
机构
[1] Chinese Acad Sci, Inst Solid State Phys, Key Lab Mat Phys, Hefei 230031, Peoples R China
关键词
chemical solution deposition; manganites; colossal magnetoresistance; growth models; seed layer; interfaces;
D O I
10.1016/j.jcrysgro.2006.11.205
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
The preparing technique of chemical solution deposition (CSD) for La0.85Ag0.15MnO3 and La0.85Ag0.1MnO3 colossal magnetoresistance (CM R) film is investigated. Polycrystalline-like La0.85Ag0.15MnO3 films are obtained on LaAlO3 (h 0 0) and YSZ (h 0 0) singlecrystal substrates as a seed layer is not utilized. However, as a seed layer is used, an epitaxial-like La0.85Ag0.1MnO3 film can be successfully fabricated on LaAlO3 (h 0 0) single-crystal substrate. XRD shows that Ag atoms can substitute La atoms without forming any second phases. The magneto-transport property measurement shows that the polycrystalline-like La0.85Ag0.15MnO3 and the epitaxial-like La0.85Ag0.10MnO3 films behave as CMR effect in the whole temperature region below metal-insulator transition (T-P) and in the vicinity of T-P, respectively. The results indicate that the CSD method is a worthwhile technique for preparing manganite CMR films with tuning grain orientations. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:330 / 335
页数:6
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