Methyl monolayers improve the fracture strength and durability of silicon nanobeams

被引:15
作者
Alan, Tuncay [1 ]
Zehnder, Alan T.
Sengupta, Debodhonyaa
Hines, Melissa A.
机构
[1] Cornell Univ, Dept Theoret & Appl Mech, Ithaca, NY 14853 USA
[2] Cornell Univ, Dept Chem & Chem Biol, Ithaca, NY 14853 USA
基金
美国国家科学基金会;
关键词
POLYCRYSTALLINE SILICON; MECHANICAL STRENGTH; POLYSILICON FILMS; FATIGUE; SI(111); TEMPERATURE; STRESS;
D O I
10.1063/1.2400180
中图分类号
O59 [应用物理学];
学科分类号
摘要
Monolayer-thick coatings have a significant effect on the fracture strength and durability of 210-nm-thick, smooth (similar to 0.4 nm rms roughness), single crystal silicon nanobeams. The initial Weibull fracture strength of beams terminated with a methyl (CH3) monolayer was 18.2 GPa. This strength did not degrade after a 23-day exposure to air. In contrast, beams terminated with a monolayer of hydrogen atoms were initially weaker than methyl-terminated beams, and their strength degraded rapidly in air. After a 23-day air exposure, the strength of H-terminated beams was reduced by at least 30%. Since strength durability is correlated with the oxidation resistance of the monolayers, the degradation of H-terminated beams is attributed to the formation of oxide nuclei that act as local stress concentrators. (c) 2006 American Institute of Physics.
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页数:3
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