Large-area and high-resolution distortion measurement based on moire fringe method for hot embossing process

被引:6
作者
Xu, Zhiguang [1 ,2 ,3 ]
Taylor, Hayden K. [1 ,3 ]
Boning, Duane S. [1 ,3 ]
Yoon, Soon Fatt [2 ,3 ]
Youcef-Toumi, Kamal [1 ,3 ]
机构
[1] MIT, Cambridge, MA 02139 USA
[2] Nanyang Technol Univ, Sch Elect & Elect Engn, Singapore 639798, Singapore
[3] Singapore MIT Alliance, Singapore 637460, Singapore
来源
OPTICS EXPRESS | 2009年 / 17卷 / 21期
关键词
LITHOGRAPHY; FABRICATION;
D O I
10.1364/OE.17.018394
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
A moire fringe approach is developed to identify simultaneously the global and local distortions in hot-embossed polymeric samples. A square grid pattern with a pitch of 63.5 mu m is hot-embossed on the polymer substrate. When a reference grid, a polymeric film with the same pattern, is placed on top of the sample, a moire fringe pattern is observed and recorded by a document scanner. The deviation of the intersections of the fringes from their ideal positions presents the residual distortion in the sample. With different sample-reference rotation angles eight images are acquired for the same sample to achieve the optimal result by a data fitting technique. The validity of this method is proved by the self-consistency of the results from the eight images. To the best of our knowledge, this is the first time distortion quantification has been achieved both in a large area up to that of a scanner and with a high resolution at the level of 1 mu m. Furthermore, we do not use any expensive instrument, nor need to measure the sample reference rotation angle or position the sample precisely, and the process is run automatically by a computer instead of manual operation. (c) 2009 Optical Society of America
引用
收藏
页码:18394 / 18407
页数:14
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