Ultramicrotomy for cross-sections of nanostructure

被引:7
作者
Quintana, C
机构
[1] Inst. de Microelectronica de Madrid, Parque Tecnológico de Madrid, 28760 Tres Cantos, Madrid
关键词
ultramicrotomy; cross-sections; microelectronics devices;
D O I
10.1016/S0968-4328(97)00023-1
中图分类号
TH742 [显微镜];
学科分类号
摘要
Ultramicrotomy is a thin sample preparative method for TEM observations. In materials science, it can be used as an alternative method to mechanical polishing and ion-milling for cross-section specimen preparation. This short communication reports results obtained for two different materials: a laser structure based in semiconductor technology (InP/GaInAs) prepared by MBE and a Au-SiFe multilayer prepared by co-sputtering. In both cases, Epon embedding medium and a diamond knife were used. The resulting cross-sections revealed good preservation of the different regions of the laser device and the presence of defects in the layers of the Au-FeSi structure. It was concluded that ultramicrotomy can be used as a routine preparative method for TEM observations of nanostructures. (C) 1997 Elsevier Science Ltd.
引用
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页码:217 / 219
页数:3
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