Local order of Te impurity atoms and free electron concentration in heavily doped GaAs:Te

被引:4
作者
Slupinski, T [1 ]
Zielinska-Rohozinska, E [1 ]
机构
[1] Warsaw Univ, Inst Expt Phys, Warsaw, Poland
关键词
heavily doped semiconductors; GaAs : Te solid solution; X-ray diffuse scattering; local order of impurities;
D O I
10.1016/S0040-6090(00)00695-7
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Zn this paper we briefly show the results of joined studies of the free electron concentration and X-ray diffuse scattering (detected by HR XRD - reciprocal space maps) as a function of Te atoms concentration in GaAs and controlled annealing of samples at high temperatures 700-1200 degrees C. The free electron concentration can be reversible changed between low and high values merely by a proper annealing of GaAs samples with Te concentration higher than similar to 4 x 10(18) cm(-3). Strong X-ray diffuse scattering is observed in annealed samples, if electron concentration is lowered. Detailed features of X-ray scattering in the reciprocal space can be very well understood within Krivoglaz microscopic model of scattering due to local correlations of impurity positions in a solid solution (local order) and related crystal lattice distortions. (C) 2000 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:227 / 231
页数:5
相关论文
共 13 条
  • [1] SCATTERING OF X-RAYS FROM CRYSTAL-SURFACES
    ANDREWS, SR
    COWLEY, RA
    [J]. JOURNAL OF PHYSICS C-SOLID STATE PHYSICS, 1985, 18 (35): : 6427 - 6439
  • [2] THE LATTICE LOCATIONS OF SILICON ATOMS IN DELTA-DOPED LAYERS IN GAAS
    ASHWIN, MJ
    FAHY, M
    HARRIS, JJ
    NEWMAN, RC
    SANSOM, DA
    ADDINALL, R
    MCPHAIL, DS
    SHARMA, VKM
    [J]. JOURNAL OF APPLIED PHYSICS, 1993, 73 (02) : 633 - 639
  • [3] X-ray diffuse scattering characterization of microdefects in highly Te-doped annealed GaAs crystals
    Borowski, J
    Gronkowski, J
    Zielinska-Rohozinska, E
    Slupinski, T
    [J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1998, 31 (15) : 1883 - 1887
  • [4] CHANGES IN ELECTRON CONCENTRATION OF DONOR-DOPED GAAS CRYSTALS CAUSED BY ANNEALING
    FULLER, CS
    WOLFSTIRN, KB
    [J]. JOURNAL OF APPLIED PHYSICS, 1963, 34 (08) : 2287 - +
  • [5] Krivoglaz M. A., 1969, Theory of X-ray and Thermal Neutron Scattering by Real Crystals
  • [6] KRIVOGLAZ MA, 1959, FIZ MET METALLOVED, V8, P648
  • [7] KRIVOGLAZ MA, 1986, DUFFUSE SCATTERING X
  • [8] SI-DEFECT CONCENTRATIONS IN HEAVILY SI-DOPED GAAS - CHANGES INDUCED BY ANNEALING
    KUNG, JK
    SPITZER, WG
    [J]. JOURNAL OF APPLIED PHYSICS, 1974, 45 (10) : 4477 - 4486
  • [9] SILICON DOPING OF MBE-GROWN GAAS FILMS
    NEAVE, JH
    DOBSON, PJ
    HARRIS, JJ
    DAWSON, P
    JOYCE, BA
    [J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1983, 32 (04): : 195 - 200
  • [10] SLUPINSKI T, 1999, THESIS WARSAW U