Colloidal atomic layer deposition

被引：0
|
作者：
Cho, Wooje [1 ]
Hazarika, Abhijit [1 ]
Mulloy, Kavan [1 ]
Portner, Joshua [1 ]
Talapin, Dmitri [1 ]
机构：
[1] Univ Chicago, Chem, Chicago, IL 60637 USA
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2019年 / 257卷
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D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
557
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页数：1
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