High reflectance Cr/C multilayer at 250 eV for soft X-ray polarimetry

被引:12
|
作者
Wen, Mingwu [1 ]
Jiang, Li [1 ]
Zhang, Zhong [1 ]
Huang, Qiushi [1 ]
Wang, Zhanshan [1 ]
She, Rui [2 ]
Feng, Hua [2 ]
Wang, Hongchang [3 ]
机构
[1] Tongji Univ, IPOE, Sch Phys Sci & Engn, MOE Key Lab Adv Microstruct Mat, Shanghai 200092, Peoples R China
[2] Tsinghua Univ, Dept Engn Phys, Beijing 100084, Peoples R China
[3] Diamond Light Source, Didcot OX11 0DE, Oxon, England
基金
中国国家自然科学基金;
关键词
Soft X-ray; Polarization; Chromium; Carbon; Cr/C multilayer; Direct current magnetron sputtering; Transmission electron microscopy; RADIATION; ELEMENTS; FILMS;
D O I
10.1016/j.tsf.2015.06.005
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
X-ray reflection near 45 degrees via multilayer mirrors can be used for astronomical polarization measurements. A Cr/C multilayer mirror (designed for X-ray polarimetry at 250 eV), with a period thickness of 3.86 nm and a bi-layer number of 100, was fabricated using direct current magnetron sputtering. Grazing incidence X-ray reflectometry at 8 keV and transmission electron microscopy were used to investigate the multilayer structure. Different models were introduced to fit the hard X-ray reflectivity curve, which indicates that the layer thickness of two materials slightly drifts from the bottom to the top of the stack. Both the chromium and carbon layers are amorphous with asymmetric interfaces, while the Cr-on-C interface is slightly wider. Based on the good quality of the multilayer structure, a high reflectivity of 21.8% for the s-polarized light was obtained at 250 eV at a grazing incidence angle of 40.7 degrees. The fabricated Cr/C multilayer mirror exhibits high reflectivity and polarization levels in the energy region of 240 eV-260 eV. (C) 2015 Elsevier B.V. All rights reserved.
引用
收藏
页码:262 / 265
页数:4
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