Changes in VO2 band structure induced by charge localization and surface segregation

被引:53
作者
Chen, Changhong [1 ,2 ,3 ]
Fan, Zhaoyang [1 ,2 ]
机构
[1] Texas Tech Univ, Nano Tech Ctr, Lubbock, TX 79409 USA
[2] Texas Tech Univ, Dept Elect & Comp Engn, Lubbock, TX 79409 USA
[3] Huazhong Univ Sci & Technol, Wuhan Natl Lab Optoelect, Wuhan 430074, Peoples R China
关键词
band structure; binding energy; doping; Fermi level; impurity distribution; impurity states; localised states; surface segregation; vacancies (crystal); valence bands; vanadium compounds; TRANSITION; PHOTOEMISSION;
D O I
10.1063/1.3280375
中图分类号
O59 [应用物理学];
学科分类号
摘要
Vanadium vacancies introduce acceptor doping with hole localization, while oxygen vacancies cause electron localization and donor doping. As deposition temperature increases, donor concentration stays constant, whereas acceptor concentration significantly increases, leading to enhanced (011) lattice-plane compression and surface segregation. Localized charges result in shifts of O 1s and V4+ 2p core levels toward higher binding energies, and O 2p and V4+ 3d valence bands toward the Fermi level, but e(g)(pi) bands lifting and a(1g) bands splitting energies are both insensitive to charge localization. Particularly, band-gap energy decreases with increasing V-V pair distance, and is significantly reduced by band tailing.
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页数:3
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