Deposition of boron carbide powder by a pulsed high-current arc plasma

被引：1
作者：
Kitamura, J
Usuba, S
机构：
[1] Fujimi Inc., Aichi
来源：
ELECTRICAL ENGINEERING IN JAPAN | 2004年 / 149卷 / 01期
关键词：
high-current arc; plasma spraying; electromagnetic acceleration; boron carbide; hard coating;
D O I：
10.1002/eej.20005
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
A novel high-velocity thermal spraying was experimentally investigated using a pulsed high-current electromagnetically accelerated arc plasma. By spraying boron carbide (B4C) powder with a pulsed high-current arc plasma of 10(5) A in a coaxial plasma gun, a dense deposit of crystalline B4C with a Vickers hardness of 2600 kgf/mm(2) was obtained on SUS304 substrates. The impact velocity of the sprayed B4C particles was thought to be more than 2.5 km/s for powder less than 10 pm in diameter and about 2 km/s for that of 30 +/- 10 muM. (C) 2004 Wiley Periodicals, Inc.
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页码：1 / 7
页数：7
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