Phase transformation of A15 crystal structure chromium thin films grown by the sputter deposition

被引:17
作者
Chu, JP
Chang, JW
Lee, PY
机构
[1] Institute of Materials Engineering, National Taiwan Ocean University
关键词
chromium thin films; A15 crystal structure; phase transformation; RF magnetron sputtering;
D O I
10.1016/S0254-0584(97)80180-0
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Phase transformation of non-BCC delta-A15 Cr thin films prepared by r.f. magnetron sputtering has been characterized. Using differential scanning calorimetry (DSC), we demonstrated for the first time that the phase transformation of the delta-A15 Cr phase to the equilibrium alpha-BCC Cr phase is an irreversible, exothermic, first-order transition. At a heating rate of 10 degrees C min(-1), the onset and peak temperatures of transformation were determined to be 428 and 437 degrees C, respectively. The enthalpy change of the transformation, Delta H, was estimated to be in a range from -6 to -12 kJ mol(-1). The uncertainty of Delta H was attributed to an ill-defined transition completion temperature and an incorporation of substrate material into the DSC him samples analyzed. Our in situ DSC results confirmed the metastable and allotropic nature of delta-A15 Cr phase, which has been proposed by other prior studies using conventional ex situ X-ray and electron diffraction methods. Our X-ray photoelectron spectroscopy analyses on as-deposited and annealed films showed that while the chrome oxides or carbides were formed inevitably in annealed films the Cr and O were mostly in the unbound states. Hence, it is unlikely that the delta-A15 Cr phase is of an oxide phase.
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页码:31 / 36
页数:6
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