Fabrication of plasmonic cavity arrays for SERS analysis

被引:8
作者
Li, Ning [1 ]
Feng, Lei [1 ]
Teng, Fei [1 ]
Lu, Nan [1 ]
机构
[1] Jilin Univ, State Key Lab Supramol Struct & Mat, Coll Chem, Changchun 130012, Peoples R China
基金
中国国家自然科学基金;
关键词
plasmonic cavity; hot area; resist pattern; reproducibility; SERS; ENHANCED RAMAN-SCATTERING; FIELD ENHANCEMENT; SURFACE; SPECTROSCOPY; SENSORS;
D O I
10.1088/1361-6528/aa6952
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The plasmonic cavity arrays are ideal substrates for surface enhanced Raman scattering analysis because they can provide hot spots with large volume for analyte molecules. The large area increases the probability to make more analyte molecules on hot spots and leads to a high reproducibility. Therefore, to develop a simple method for creating cavity arrays is important. Herein, we demonstrate how to fabricate a V and W shape cavity arrays by a simple method based on self-assembly. Briefly, the V and W shape cavity arrays are respectively fabricated by taking KOH etching on a nanohole and a nanoring array patterned silicon (Si) slides. The nanohole array is generated by taking a reactive ion etching on a Si slide assembled with monolayer of polystyrene (PS) spheres. The nanoring array is generated by taking a reactive ion etching on a Si slide covered with a monolayer of octadecyltrichlorosilane before self-assembling PS spheres. Both plasmonic V and W cavity arrays can provide large hot area, which increases the probability for analyte molecules to deposit on the hot spots. Taking 4-Mercaptopyridine as analyte probe, the enhancement factor can reach 2.99 x 10(5) and 9.97 x 10(5) for plasmonic V cavity and W cavity array, respectively. The relative standard deviations of the plasmonic V and W cavity arrays are 6.5% and 10.2% respectively according to the spectra collected on 20 random spots.
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页数:8
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