Bias voltage induced n- to p-type transition in epitaxial bilayer graphene on SiC

被引:15
作者
Guo, Yufeng [1 ,2 ,3 ]
Guo, Wanlin [1 ,2 ,3 ]
Chen, Changfeng [2 ,3 ]
机构
[1] Nanjing Univ Aeronaut & Astronaut, Inst Nanosci, Nanjing 210016, Peoples R China
[2] Univ Nevada, Dept Phys, Las Vegas, NV 89154 USA
[3] Univ Nevada, High Pressure Sci & Engn Ctr, Las Vegas, NV 89154 USA
关键词
ab initio calculations; charge transfer states; density functional theory; energy gap; Fermi level; graphene; semiconductor epitaxial layers; INITIO MOLECULAR-DYNAMICS; SUBSTRATE;
D O I
10.1103/PhysRevB.80.085424
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We show by extensive first-principles calculations that an n- to p-type transition in epitaxial bilayer graphene can be induced by applying bias voltage on C-terminated SiC substrate, but cannot occur on Si-terminated SiC. Bias voltage can cause enough charge transfer between top and bottom graphene layers on C-terminated SiC to shift the Dirac level below or above the Fermi level. On both C- and Si-terminated SiC, change in interlayer spacing of the epitaxial bilayer graphene produces charge redistribution that leads to large increase in the energy gap, but cannot raise the Dirac level efficiently. The surface terminated condition or properties of substrate are of essential importance in possible gate tuning electronic behavior of epitaxial graphene on it.
引用
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页数:5
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