The annealing of radiation damage in zircon by low-energy electron irradiation was explored systematically. Natural zircon samples spanning a wide range of self-irradiation damage were irradiated with the focused electron beam of an electron probe microanalyser. The effects of beam current and irradiation time were tested systematically, and the changes in zircon were measured using Raman spectroscopy. Our results confirm the damage-annealing effect of an accelerated electron beam. We demonstrate that non-thermal annealing occurs through electron-enhanced defect reactions and that the extent of the annealing is a function of both the irradiation time and the beam current. The complete annealing of radiation damage in zircon by an accelerated electron beam was not possible under the conditions of our experiments. Our results indicate that Raman band broadening in ion-irradiated zircon can possibly be explained through phonon confinement, as the estimated domain sizes of the crystalline volume amid recoil clusters decrease with increasing alpha dose. The results underlay the importance of doing Raman spectroscopy before electron-beam and ion-beam analysis. To avoid unwanted beam-induced annealing of damage in zircon during EPMA analysis, the electron energy transferred per volume unit of sample should be minimised, for instance by keeping the integrated charge low and/or by defocusing the electron beam.
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Drexel Univ, Dept Mat Sci & Engn, Philadelphia, PA 19104 USA
Drexel Univ, AJ Drexel Nanotechnol Inst, Philadelphia, PA 19104 USADrexel Univ, Dept Mat Sci & Engn, Philadelphia, PA 19104 USA
Osswald, S.
Mochalin, V. N.
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Drexel Univ, Dept Mat Sci & Engn, Philadelphia, PA 19104 USA
Drexel Univ, AJ Drexel Nanotechnol Inst, Philadelphia, PA 19104 USADrexel Univ, Dept Mat Sci & Engn, Philadelphia, PA 19104 USA
Mochalin, V. N.
Havel, M.
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Drexel Univ, Dept Mat Sci & Engn, Philadelphia, PA 19104 USA
Drexel Univ, AJ Drexel Nanotechnol Inst, Philadelphia, PA 19104 USADrexel Univ, Dept Mat Sci & Engn, Philadelphia, PA 19104 USA
Havel, M.
Yushin, G.
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Georgia Inst Technol, Dept Mat Sci & Engn, Atlanta, GA 30332 USADrexel Univ, Dept Mat Sci & Engn, Philadelphia, PA 19104 USA
Yushin, G.
Gogotsi, Y.
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Drexel Univ, Dept Mat Sci & Engn, Philadelphia, PA 19104 USA
Drexel Univ, AJ Drexel Nanotechnol Inst, Philadelphia, PA 19104 USADrexel Univ, Dept Mat Sci & Engn, Philadelphia, PA 19104 USA
机构:
Drexel Univ, Dept Mat Sci & Engn, Philadelphia, PA 19104 USA
Drexel Univ, AJ Drexel Nanotechnol Inst, Philadelphia, PA 19104 USADrexel Univ, Dept Mat Sci & Engn, Philadelphia, PA 19104 USA
Osswald, S.
Mochalin, V. N.
论文数: 0引用数: 0
h-index: 0
机构:
Drexel Univ, Dept Mat Sci & Engn, Philadelphia, PA 19104 USA
Drexel Univ, AJ Drexel Nanotechnol Inst, Philadelphia, PA 19104 USADrexel Univ, Dept Mat Sci & Engn, Philadelphia, PA 19104 USA
Mochalin, V. N.
Havel, M.
论文数: 0引用数: 0
h-index: 0
机构:
Drexel Univ, Dept Mat Sci & Engn, Philadelphia, PA 19104 USA
Drexel Univ, AJ Drexel Nanotechnol Inst, Philadelphia, PA 19104 USADrexel Univ, Dept Mat Sci & Engn, Philadelphia, PA 19104 USA
Havel, M.
Yushin, G.
论文数: 0引用数: 0
h-index: 0
机构:
Georgia Inst Technol, Dept Mat Sci & Engn, Atlanta, GA 30332 USADrexel Univ, Dept Mat Sci & Engn, Philadelphia, PA 19104 USA
Yushin, G.
Gogotsi, Y.
论文数: 0引用数: 0
h-index: 0
机构:
Drexel Univ, Dept Mat Sci & Engn, Philadelphia, PA 19104 USA
Drexel Univ, AJ Drexel Nanotechnol Inst, Philadelphia, PA 19104 USADrexel Univ, Dept Mat Sci & Engn, Philadelphia, PA 19104 USA