Fabrication of high-aspect-ratio microscale Ta mold inserts with micro electrical discharge machining

被引:30
作者
Cao, D. M. [1 ]
Jiang, J. [1 ]
Meng, W. J. [1 ]
Jiang, J. C. [1 ]
Wang, W. [1 ]
机构
[1] Louisiana State Univ, Dept Mech Engn, Baton Rouge, LA 70803 USA
来源
MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS | 2007年 / 13卷 / 5-6期
基金
美国国家科学基金会;
关键词
D O I
10.1007/s00542-006-0198-8
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We report fabrication of microscale Ta mold inserts by micro-electrical-discharge-machining (mu EDM). Morphology, chemistry, and structure of the near-surface region of as-mu EDMed Ta blanks have been characterized by scanning electron microscopy, X-ray photoelectron spectroscopy, and transmission electron microscopy. A TaC surface layer forms on as-mu EDMed Ta surfaces. This altered surface layer was removed by electro-chemical-polishing. Further modification of Ta insert surfaces was accomplished by deposition of a conformal Ti-containing hydrogenated carbon coating. We demonstrate successful replication of high-aspect-ratio microscale structures in Al and Cu by compression molding with such surface-engineered Ta mold inserts.
引用
收藏
页码:503 / 510
页数:8
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