Three-dimensional carbon nanowall structures

被引:76
作者
Chuang, Alfred T. H. [1 ]
Robertson, John
Boskovic, Bojan O.
Koziol, Krzysztof K. K.
机构
[1] Univ Cambridge, Dept Engn, Cambridge CB3 0FA, England
[2] Univ Cambridge, Dept Mat Sci, Cambridge CB2 3QZ, England
关键词
D O I
10.1063/1.2715441
中图分类号
O59 [应用物理学];
学科分类号
摘要
The authors report the growth of carbon nanowalls in freestanding, three-dimensional aggregates by microwave plasma-enhanced chemical vapor deposition. Carbon nanowalls extrude from plasma sites into three-dimensional space. The growth is catalyst-free and not limited by nucleating surfaces. The growth mechanism is discussed and compared with similar carbon nanomaterials. High surface area of as-grown carbon nanowalls indicates a potential for electrochemical applications. Field emission measurements show a low field turn-on and long-term stability. The results establish a scalable production method and possible applications using field emission or high surface area. (c) 2007 American Institute of Physics.
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页数:3
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