Exposure Dose Dependence of Chemical Gradient in Chemically Amplified Extreme Ultraviolet Resists

被引：14

作者：

Kozawa, Takahiro ^{[1
,2
]}

Tagawa, Seiichi ^{[1
,2
]}

机构：

[1] Osaka Univ, Inst Sci & Ind Res, Osaka 5670047, Japan

[2] Osaka Univ, CREST, Japan Sci & Technol Agcy, Osaka 5670047, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 2009年 / 48卷 / 10期

关键词：

LINE EDGE ROUGHNESS; ACID GENERATION EFFICIENCY; X-RAY-LITHOGRAPHY; ELECTRON-BEAM; EUV LITHOGRAPHY; IMAGE-CONTRAST; POSITIVE-TONE; YIELD;

D O I：

10.1143/JJAP.48.106504

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The dependence of line edge roughness (LER) on exposure dose has been investigated. LER is believed to be inversely proportional to the square root of exposure dose. The dependence has been also known as a trade-off relationship between sensitivity and LER. In this study, the exposure dose dependence of LER was investigated in terms of chemical gradient, which correlates with LER. It was-found that the exposure dose dependence of the chemical gradient is not as simple as the as the inverse-square-root-dose. The relationship between chemical gradient and exposure dose depends on the type of resist, rate constant for deprotection and dissolution property of the polymer. (C) 2009 The Japan Society of Applied Physics

引用

页码：1065041 / 1065045

页数：5

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