Accounting for the resistivity contribution of grain boundaries in metals: critical analysis of reported experimental and theoretical data for Ni and Cu

被引:39
作者
Bakonyi, I [1 ]
机构
[1] Wigner Res Ctr Phys, Inst Solid State Phys & Opt, Konkoly Thege Ut 29-33, H-1121 Budapest, Hungary
关键词
MEAN-FREE-PATH; ELECTRICAL-RESISTIVITY; ELECTRONIC TRANSPORT; POLYCRYSTALLINE FILMS; COPPER; CONDUCTIVITY; RESISTANCE; SCATTERING; MODEL; SIZE;
D O I
10.1140/epjp/s13360-021-01303-4
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
In the present paper, reported literature data on the grain-size dependence of resistivity of Ni and Cu are critically evaluated by two conceptually different methods. One is the phenomenological approach of Andrews (Phys. Lett. 19: 558, 1965) according to which in a polycrystalline metal there is a resistivity contribution inversely proportional to the average grain diameter, the proportionality constant defined as the Andrews parameter A. The other method is the customary Mayadas-Shatzkes (MS) model (Phys Rev B 1: 1382, 1970) yielding a grain-boundary reflection coefficient R. During the analysis, special care was taken to rely only on data for which the surface scattering resistivity contribution was definitely negligibly small and the grain size was determined by direct microscopy imaging. By sorting out with this analysis the most reliable grain-size-dependent resistivity data for polycrystalline Ni and Cu metals with random grain boundaries, we have then derived the current best room-temperature values of the Andrews parameter A, the specific grain-boundary resistivity and the reflection coefficient R. We have also found a fairly good relation between the parameters A and R and compared the experimental values with their theoretical estimates reported in the literature. Then, the conceptual differences between the two approaches are discussed and the deficiencies of the MS model, especially in connection with the validity of Matthiessen's rule, are highlighted. A major conclusion is that by the Andrews method one can derive a model-independent reliable parameter characterizing the grain-boundary contribution to the resistivity of metals.
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页数:48
相关论文
共 89 条
[1]   RESISTIVITY DUE TO GRAIN BOUNDARIES IN PURE COPPER [J].
ANDREWS, PV .
PHYSICS LETTERS, 1965, 19 (07) :558-&
[2]   EFFECT OF GRAIN BOUNDARIES ON ELECTRICAL RESISTIVITY OF POLYCRYSTALLINE COPPER AND ALUMINIUM [J].
ANDREWS, PV ;
WEST, MB ;
ROBESON, CR .
PHILOSOPHICAL MAGAZINE, 1969, 19 (161) :887-&
[3]   SOME TRANSPORT-PROPERTIES OF TRANSITION-METAL FILMS [J].
ANGADI, MA .
JOURNAL OF MATERIALS SCIENCE, 1985, 20 (03) :761-796
[4]  
[Anonymous], 1986, Introduction to Solid State Physics
[5]   INFLUENCE OF GRAIN-BOUNDARY AND SURFACE SCATTERING ON THE ELECTRICAL-RESISTIVITY OF SINGLE-LAYERED THIN COPPER-FILMS [J].
ARTUNC, N ;
OZTURK, ZZ .
JOURNAL OF PHYSICS-CONDENSED MATTER, 1993, 5 (05) :559-566
[6]  
Ashcroft N. W., 1981, Solid State Physics
[7]   ELECTRICAL-RESISTIVITY OF BULK NANOCRYSTALLINE NICKEL [J].
AUS, MJ ;
SZPUNAR, B ;
ERB, U ;
ELSHERIK, AM ;
PALUMBO, G ;
AUST, KT .
JOURNAL OF APPLIED PHYSICS, 1994, 75 (07) :3632-3634
[8]   Preparation and characterization of dc-plated nanocrystalline nickel electrodeposits [J].
Bakonyi, I ;
TothKadar, E ;
Pogany, L ;
Cziraki, A ;
Gerocs, I ;
VargaJosepovits, K ;
Arnold, B ;
Wetzig, K .
SURFACE & COATINGS TECHNOLOGY, 1996, 78 (1-3) :124-136
[9]   The specific grain-boundary electrical resistivity of Ni [J].
Bakonyi, I. ;
Isnaini, V. A. ;
Kolonits, T. ;
Czigany, Zs. ;
Gubicza, J. ;
Varga, L. K. ;
Toth-Kadar, E. ;
Pogany, L. ;
Peter, L. ;
Ebert, H. .
PHILOSOPHICAL MAGAZINE, 2019, 99 (09) :1139-1162
[10]  
BAKONYI I, 1994, NATO ADV SCI INST SE, V260, P423