DC Magnetron Sputtering Deposition of Titanium Oxide Nanoparticles: Influence of Temperature, Pressure and Deposition Time on the Deposited Layer Morphology, the Wetting and Optical Surface Properties

被引:17
作者
Dreesen, Laurent [1 ]
Cecchet, Francesca [2 ]
Lucas, Stephane [3 ]
机构
[1] Univ Liege, Dept Phys, Inst Phys, B-4000 Liege, Belgium
[2] Univ Namur FUNDP, Ctr Rech Phys Mat & Rayonnement PMR, LLS, B-5000 Namur, Belgium
[3] Univ Namur FUNDP, Ctr Rech Phys Mat & Rayonnement PMR, LARN, B-5000 Namur, Belgium
关键词
nanostructures; optical properties; physical vapour deposition; surface morphology; wettability; TIO2; THIN-FILMS; ANATASE; PYROLYSIS; MECHANISM; SIZE;
D O I
10.1002/ppap.200932201
中图分类号
O59 [应用物理学];
学科分类号
摘要
Titanium dioxide nanoparticles were prepared on glass substrates by reactive DC magnetron sputtering. As highlighted by the atomic force microscopy characterization, we were able to control the nanoparticles' surface coverage and diameter by varying the deposition time and the total pressure, respectively. The titanium dioxide energy band gap, determined by using ultraviolet-visible spectroscopy, depends on the total pressure but is quite independent on the deposition temperature. On the contrary, it is blue shifted when the pressure increases. Finally, the contact angles slightly decrease after ultraviolet illumination irrespective of the different deposition parameters, indicating an improvement of the hydrophilic properties of the adsorbed layer. After 21 h in dark, the contact angles are nearly identical to the ones before exposure to UV light: the samples do not keep their hydrophilic behaviour.
引用
收藏
页码:S849 / S854
页数:6
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