Monte Carlo Simulation of Switching Dynamics in Polycrystalline Ferroelectric Capacitors

被引:44
作者
Alessandri, Cristobal [1 ,2 ]
Pandey, Pratyush [1 ]
Abusleme, Angel [2 ]
Seabaugh, Alan [1 ]
机构
[1] Univ Notre Dame, Dept Elect Engn, Notre Dame, IN 46556 USA
[2] Pontificia Univ Catolica Chile, Dept Elect Engn, Santiago 7820436, Chile
基金
美国国家科学基金会;
关键词
Ferroelectric (FE); hafnium zirconate (HZO); Monte Carlo; nucleation-limited switching (NLS); KINETICS;
D O I
10.1109/TED.2019.2922268
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Ferroelectric (FE) materials are being studied for a variety of applications in memory, logic, and neuromorphic computing, for which predictive models of FE polarization are essential. In this paper, we present a Monte Carlo simulation framework capable of predicting the dynamic, history-dependent response of an FE under arbitrary input waveforms. The simulation is developed by generalizing the physics-based nucleation-limited switching model for polarization reversal in a polycrystalline FE. Measured polarization reversal data from fabricated FE Hf0.5Zr0.5O2 capacitors are used to extract the statistical distribution of FE grains. After parameter extraction, the model is able to predict the dynamics of the FE capacitor without further calibration. Finally, the model is applied to characterize the dynamic response of FE-dielectric bilayer structures and quantify the reduction in memory window due to device variability.
引用
收藏
页码:3527 / 3534
页数:8
相关论文
共 29 条
  • [1] Alessandri C., 2018, IEDM
  • [2] Switching Dynamics of Ferroelectric Zr-Doped HfO2
    Alessandri, Cristobal
    Pandey, Pratyush
    Abusleme, Angel
    Seabaugh, Alan
    [J]. IEEE ELECTRON DEVICE LETTERS, 2018, 39 (11) : 1780 - 1783
  • [3] [Anonymous], 2017, PROC 75 ANN DEVICE R
  • [4] Accelerated and Decelerated Polarization Reversal in Thin Vinylidene Fluoride/Trifluoroethylene Copolymer Films
    Arayashiki, Y.
    Nakajima, T.
    Takahashi, Y.
    Furukawa, T.
    [J]. IEEE TRANSACTIONS ON DIELECTRICS AND ELECTRICAL INSULATION, 2010, 17 (04) : 1066 - 1073
  • [5] Aziz A, 2018, DES AUT TEST EUROPE, P1289, DOI 10.23919/DATE.2018.8342213
  • [6] Balluffi RW, 2005, KINETICS OF MATERIALS, P1
  • [7] Böscke TS, 2011, 2011 IEEE INTERNATIONAL ELECTRON DEVICES MEETING (IEDM)
  • [8] Multidomain ferroelectricity as a limiting factor for voltage amplification in ferroelectric field-effect transistors
    Cano, A.
    Jimenez, D.
    [J]. APPLIED PHYSICS LETTERS, 2010, 97 (13)
  • [9] Universal Polarization Switching Behavior of Disordered Ferroelectrics
    Genenko, Yuri A.
    Zhukov, Sergey
    Yampolskii, Sergey V.
    Schuetrumpf, Joerg
    Dittmer, Robert
    Jo, Wook
    Kungl, Hans
    Hoffmann, Michael J.
    von Seggern, Heinz
    [J]. ADVANCED FUNCTIONAL MATERIALS, 2012, 22 (10) : 2058 - 2066
  • [10] Nucleation limited switching (NLS) model for HfO2-based metal-ferroelectric-metal (MFM) capacitors: Switching kinetics and retention characteristics
    Gong, N.
    Sun, X.
    Jiang, H.
    Chang-Liao, K. S.
    Xia, Q.
    Ma, T. P.
    [J]. APPLIED PHYSICS LETTERS, 2018, 112 (26)