High electronic excitations and ion beam mixing effects in high energy ion irradiated Fe/Si multilayers

被引:51
作者
Bauer, P
Dufour, C
Jaouen, C
Marchal, G
Pacaud, J
Grilhe, J
Jousset, JC
机构
[1] UNIV POITIERS,MET PHYS LAB,F-86022 POITIERS,FRANCE
[2] CTR INTERDISCIPLINAIRE RECH IONS LOURDS,F-14040 CAEN,FRANCE
关键词
D O I
10.1063/1.363996
中图分类号
O59 [应用物理学];
学科分类号
摘要
Mossbauer spectroscopy (Fe-57) shows evidence for mixing effects induced by electronic energy deposition in nanoscale Fe/Si multilayers irradiated with swift heavy ions. A decrease in the mixing efficiency with electronic stopping power is reported; a threshold is found, under which iron environment modifications no longer occur. The kinetics of Fe-Si phase formation after irradiation suggests the existence of three regimes: (i) for high excitation levels, a magnetic amorphous phase is formed directly in the wake of the incoming ion and an almost complete mixing is reached at low fluence (10(13) U/cm(2)); (ii) for low excitation levels, a paramagnetic Si-rich amorphous phase is favored at the interface while crystalline iron subsists at high fluences; (iii) for intermediate excitation levels, saturation effects are observed and the formation rate of both magnetic and paramagnetic phases points to direct mixing in the ion wake but with a reduced track length in comparison to U irradiation. The measured interfacial mixing cross section induced by electronic energy deposition suggests that a thermal diffusion process is mainly involved in addition to damage creation. (C) American Institute of Physics.
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页码:116 / 125
页数:10
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