Implications of polishing techniques in quantitative x-ray microanalysis

被引：12
作者：
Rémond, G
Nockolds, C
Phillips, M
Roques-Carmes, C
机构：
[1] Univ Sydney, Australian Key Ctr Microscopy & Microanal, Sydney, NSW 2006, Australia
[2] Ecole Natl Mecan & Microtech, Lab Microanal Surface, Besancon, France
[3] Univ Sydney, Electron Microscope Unit, Sydney, NSW 2006, Australia
[4] Univ Technol Sydney, Microstruct Anal Unit, Sydney, NSW 2007, Australia
来源：
JOURNAL OF RESEARCH OF THE NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY | 2002年 / 107卷 / 06期
关键词：
abrasive wear; bound abrasives; chemical-mechanical polishing; loose abrasives; polishing; surface and subsurface damage; x-ray microanalysis;
D O I：
10.6028/jres.107.052
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
Specimen preparation using abrasives results in surface and subsurface mechanical (stresses, strains), geometrical (roughness), chemical (contaminants, reaction products) and physical modifications (structure, texture, lattice defects). The mechanisms involved in polishing with abrasives are presented to illustrate the effects of surface topography, surface and subsurface composition and induced lattice defects on the accuracy of quantitative x-ray microanalysis of mineral materials with the electron probe microanalyzer (EPMLambda).
引用
收藏
页码：639 / 662
页数：24
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